tag: DRAM

DRAM’s Persistent Threat To Chip Security
By Bryon Moyer - 10 Feb, 2021 - Comments: 0

A well-known DRAM vulnerability called "rowhammer," which allows an assailant to disrupt or take control of a system, continues to haunt the chip industry. Solutions have been tried, and new ones are being proposed, but the potential for a major attack persists. First discovered some five years ago, most of the efforts to eliminate the "rowhammer" threat have done little more than mitigate t... » read more

Manufacturing Bits: Feb. 2
By Mark LaPedus - 02 Feb, 2021 - Comments: 0

Capacitor-less DRAM At the recent 2020 International Electron Devices Meeting (IEDM), Imec presented a paper on a novel capacitor-less DRAM cell architecture. DRAM is used for main memory in systems, and today’s most advanced devices are based on roughly 18nm to 15nm processes. The physical limit for DRAM is somewhere around 10nm. DRAM itself is based on a one-transistor, one-capacito... » read more

Fearless Chip Forecasts For 2021
By Mark LaPedus - 21 Jan, 2021 - Comments: 0

It’s been a roller coaster ride in the semiconductor industry. In early 2020, the semiconductor business looked bright, but then the Covid-19 pandemic struck, causing a sudden downturn. By mid-2020, though, the market bounced back, as the stay-at-home economy drove demand for computers, tablets and TVs. The chip market ended on a high note in 2020, but the question is, what’s in store fo... » read more

Hidden Costs In Faster, Low-Power AI Systems
By Ed Sperling - 20 Jan, 2021 - Comments: 1

Chipmakers are building orders of magnitude better performance and energy efficiency into smart devices, but to achieve those goals they also are making tradeoffs that will have far-reaching, long-lasting, and in some cases unknown impacts. Much of this activity is a direct result of pushing intelligence out to the edge, where it is needed to process, sort, and manage massive increases in da... » read more

More Data, More Memory-Scaling Problems
By Bryon Moyer - 14 Jan, 2021 - Comments: 0

Memories of all types are facing pressures as demands grow for greater capacity, lower cost, faster speeds, and lower power to handle the onslaught of new data being generated daily. Whether it's well-established memory types or novel approaches, continued work is required to keep scaling moving forward as our need for memory grows at an accelerating pace. “Data is the new economy of this ... » read more

Five Key Changes Coming With DDR5 DIMMs
By John Eble - 14 Jan, 2021 - Comments: 0

On July 14th of last year, JEDEC announced the publication of the DDR5 SDRAM standard. This signaled the nearing industry transition to DDR5 server dual-inline memory modules (DIMM). DDR5 memory brings a number of key enhancements that will bring great performance and power benefits in next generation servers. Scaling Data Rates to 6.4 Gb/s You can never have enough memory bandwidth, and DD... » read more

Process Window Optimization Of DRAM By Virtual Fabrication
By Daebin Yim - 21 Dec, 2020 - Comments: 0

New integration and patterning schemes used in 3D memory and logic devices have created manufacturing and yield challenges. Industrial focus has shifted from the scaling of predictable unit processes in 2D structures to the more challenging full integration of complex 3D structures. Conventional 2D layout DRC, offline wafer metrology, and offline electrical measurements are no longer sufficient... » read more

Revealing DRAM Operating GuardBands through Workload-Aware Error Predictive Modeling
By Technical Paper Link - 15 Dec, 2020 - Comments: 0

Abstract Abstract—Improving the energy efficiency of DRAMs becomes very challenging due to the growing demand for storage capacity and failures induced by the manufacturing process. To protect against failures, vendors adopt conservative margins in the refresh period and supply voltage. Previously, it was shown that these margins are too pessimistic and will become impractical due to high ... » read more

EUV Challenges And Unknowns At 3nm and Below
By Mark LaPedus - 19 Nov, 2020 - Comments: 1

The chip industry is preparing for the next phase of extreme ultraviolet (EUV) lithography at 3nm and beyond, but the challenges and unknowns continue to pile up. In R&D, vendors are working on an assortment of new EUV technologies, such as scanners, resists, and masks. These will be necessary to reach future process nodes, but they are more complex and expensive than the current EUV pro... » read more

A Study Of Wiggling AA Modeling And Its Impact On Device Performance In Advanced DRAM
By Coventor - 18 Nov, 2020 - Comments: 0

In this paper, a wiggling active area (fin) in an advanced 1x DRAM process was analyzed and modeled using the pattern-dependent etch simulation capabilities of the SEMulator3D semiconductor modeling software. Nonuniformity in sidewall passivation caused by hard mask pattern density loading was identified as the root cause of the wiggling profile. The calibrated model mimicked these phenomena, g... » read more

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