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ACAP At The Edge With The Versal AI Edge Series


This white paper introduces the AI Edge series to the Versal ACAP portfolio, a domain-specific architecture (DSA) that meets the strenuous demands of systems implemented in the 7nm silicon process. This series is optimized to meet the performance-per-watt requirements of edge nodes at or near the analog-digital boundary. Here, immediate response to the physical world is highly valued, and in ma... » read more

Ten Lessons From Three Generations Shaped Google’s TPUv4i


Source: Norman P. Jouppi, Doe Hyun Yoon, Matthew Ashcraft, Mark Gottscho, Thomas B. Jablin, George Kurian, James Laudon, Sheng Li, Peter Ma, Xiaoyu Ma, Nishant Patil, Sushma Prasad, Clifford Young, Zongwei Zhou (Google); David Patterson (Google / Berkeley) Find technical paper here. 2021 ACM/IEEE 48th Annual International Symposium on Computer Architecture (ISCA) Abstract–"Google de... » read more

Versal: The First Adaptive Compute Acceleration Platform (ACAP)


Recent technical challenges have forced the industry to explore options beyond the conventional “one size fits all” CPU scalar processing solution. Very large vector processing (DSP, GPU) solves some problems, but it runs into traditional scaling challenges due to inflexible, inefficient memory bandwidth usage. Traditional FPGA solutions provide programmable memory hierarchy, but the tradit... » read more

Interconnect Challenges Grow, Tools Lag


Interconnects are becoming much problematic as devices shrink and the amount of data being moved around a system continues to rise. This limitation has shown up several times in the past, and it's happening again today. But when the interconnect becomes an issue, it cannot be solved in the same way issues are solved for other aspects of a chip. Typically it results in disruption in how the t... » read more

Lithography Options For Next-Gen Devices


Chipmakers are ramping up extreme ultraviolet (EUV) lithography for advanced logic at 7nm and/or 5nm, but EUV isn’t the only lithographic option on the table. For some time, the industry has been working on an assortment of other next-generation lithography technologies, including a new version of EUV. Each technology is different and aimed at different applications. Some are here today, w... » read more

Single Vs. Multi-Patterning EUV


Extreme ultraviolet (EUV) lithography finally is moving into production, but foundry customers now must decide whether to implement their designs using EUV-based single patterning at 7nm, or whether to wait and instead deploy EUV multiple patterning at 5nm. Each patterning scheme has unique challenges, making that decision more difficult than it might appear. Targeted for 7nm, single pattern... » read more

EUV Arrives, But More Issues Ahead


EUV has arrived. After decades of development and billions of dollars of investment, EUV lithography is taking center stage at the world’s leading fabs. More than 20 years after ASML's extreme ultraviolet lithography research program began, and nearly a decade after its first pre-production exposure tools, the company expects to deliver 30 EUV exposure systems in 2019. That is nearly doubl... » read more

Top Tech Talks Of 2018


2018 shaped up to be a year of transition and inflection, sometimes in the same design. There were new opportunities in automotive, continued difficulties in scaling, and an explosion in AI and machine learning everywhere. Traffic numbers on stories give a snapshot of the most current trends, but with videos those trends are even more apparent because of the time invested in watching those v... » read more

Using DSA With EUV


James Lamb, deputy CTO for advanced semiconductor manufacturing and corporate technical fellow at Brewer Science, looks at how directed self-assembly can be used to supplement EUV at advanced nodes. https://youtu.be/PItF4egHOxc     See other tech talk videos here » read more

More Lithography/Mask Challenges (Part 3)


Semiconductor Engineering sat down to discuss lithography and photomask technologies with Gregory McIntyre, director of the Advanced Patterning Department at [getentity id="22217" e_name="Imec"]; Harry Levinson, senior fellow and senior director of technology research at [getentity id="22819" comment="GlobalFoundries"]; Regina Freed, managing director of patterning technology at [getentity id="... » read more

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