tag: eBeam Initiative

Mapping The Future Of Lithography
By Harry Levinson - 16 Feb, 2023 - Comments: 0

The SPIE Advanced Lithography + Patterning (AL+P) Symposium is always an informative event for lithographers, and looking at the Advance Program, it appears that AL+P 2023 will be no exception. The progress being made on key lithographic challenges is consistently of interest to attendees, and there will be many timely presentations that address issues of current significance. For example, r... » read more

Multi-Beam Mask Writers Are A Game Changer
By Jan Willis - 22 Dec, 2022 - Comments: 0

The eBeam Initiative’s 11th annual Luminaries survey in 2022 reported strong purchasing predictions for multi-beam mask writers, enabling both EUV and curvilinear photomask growth. A panel of experts debated remaining barriers to curvilinear photomask adoption during an event co-located with the SPIE Photomask Technology Conference in late September. Industry luminaries representing 44 compan... » read more

Increased Photomask Density And Its Impact On EDA
By Ed Sperling - 13 Dec, 2022 - Comments: 0

The ability to print curvilinear shapes on photomasks can have big repercussions on semiconductor design. Aki Fujimura, CEO of D2S, explains why mask rule checking has been bound by complex design rules, and why curvilinear shapes are important for reducing margin and simplifying the chip design process. » read more

High-NA EUV Complicates EUV Photomask Future
By Jan Willis - 17 Nov, 2022 - Comments: 0

The eBeam Initiative’s 11th annual Luminaries survey in 2022 reported EUV fueling growth of the semiconductor photomask industry while a panel of experts cited a number of complications in moving to High-NA EUV during an event co-located with the SPIE Photomask Technology Conference in late September. Industry luminaries representing 44 companies from across the semiconductor ecosystem partic... » read more

2022 Survey: Luminaries Report Positive EUV Impact On Mask Trends
By eBeam Initiative - 19 Oct, 2022 - Comments: 0

The eBeam Initiatives 11th Annual Luminaries Survey from July 2022 shows • EUV viewed as a positive impact for mask revenue • EUV remains the top reason for purchasing multi-beam mask writers • Confidence remains high in ability to make curvilinear masks with availability of multi-beam mask writers less of an issue this year Click here to read the survey results. » read more

Week In Review: Manufacturing, Test
By Karen Heyman and Anne Meixner - 30 Sep, 2022 - Comments: 0

Highlights from ITC The hot topic at this week’s International Test Conference (ITC) was tackling silent data corruption, with panel discussions, papers, and Google’s Parthasarathy Ranganathan’s keynote address all emphasizing the urgency of the issue. In the past two years Meta, Google, and Microsoft have reported on silent errors, errors not detected at test, which are adversely impact... » read more

For The Love Of Theatre And Mask-Making
By Jan Willis - 05 Jul, 2022 - Comments: 0

Naoya Hayashi has been a friend and important contributor to the eBeam Initiative from our start over 13 years ago. We’re just one of the many interests he has embraced and championed over his 45 year career at DNP. Now it’s our turn to embrace him and thank him for the wonderful memories as he pursues his next chapter after retiring as the first research fellow from DNP this June. Aki Fuji... » read more

Variation Making Trouble In Advanced Packages
By Ed Sperling - 16 Jun, 2022 - Comments: 2

Variation is becoming increasingly problematic as chip designs become more heterogeneous and targeted by application, making it difficult to identify the root cause of problems or predict what can go wrong and when. Concerns about variation traditionally have been confined to the most advanced nodes, where transistor density is highest and where manufacturing processes are still being fine-t... » read more

The Changing Mask Landscape
By Jan Willis - 19 May, 2022 - Comments: 0

Semiconductor photomasks have undergone some major technology changes in the past few years after relatively minor changes for many years. New technologies such as multi-beam mask writers and extreme ultraviolet (EUV) lithography are major breakthroughs as they ramp into high-volume manufacturing. A new trend related to these technologies is the use of curvilinear features on photomasks. Aki... » read more

Survey: 2022 Deep Learning Applications
By eBeam Initiative - 16 Mar, 2022 - Comments: 0

The 2022 member list of deep learning projects and products that eBeam members are working on in photomask to wafer semiconductor manufacturing. Participating companies include Advantest, ASML, Canon, CEA-LETI, D2S, Fraunhofer IPMS, Hitachi High-Tech Corporation, imec, NuFlare Technology, Siemens Industries Software, Inc.; Siemens EDA, STMicroelectronics, and TASMIT. Click here to see the su... » read more

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