tag: eBeam Initiative

Week In Review: Manufacturing, Test
By Karen Heyman and Anne Meixner - 30 Sep, 2022 - Comments: 0

Highlights from ITC The hot topic at this week’s International Test Conference (ITC) was tackling silent data corruption, with panel discussions, papers, and Google’s Parthasarathy Ranganathan’s keynote address all emphasizing the urgency of the issue. In the past two years Meta, Google, and Microsoft have reported on silent errors, errors not detected at test, which are adversely impact... » read more

For The Love Of Theatre And Mask-Making
By Jan Willis - 05 Jul, 2022 - Comments: 0

Naoya Hayashi has been a friend and important contributor to the eBeam Initiative from our start over 13 years ago. We’re just one of the many interests he has embraced and championed over his 45 year career at DNP. Now it’s our turn to embrace him and thank him for the wonderful memories as he pursues his next chapter after retiring as the first research fellow from DNP this June. Aki Fuji... » read more

Variation Making Trouble In Advanced Packages
By Ed Sperling - 16 Jun, 2022 - Comments: 2

Variation is becoming increasingly problematic as chip designs become more heterogeneous and targeted by application, making it difficult to identify the root cause of problems or predict what can go wrong and when. Concerns about variation traditionally have been confined to the most advanced nodes, where transistor density is highest and where manufacturing processes are still being fine-t... » read more

The Changing Mask Landscape
By Jan Willis - 19 May, 2022 - Comments: 0

Semiconductor photomasks have undergone some major technology changes in the past few years after relatively minor changes for many years. New technologies such as multi-beam mask writers and extreme ultraviolet (EUV) lithography are major breakthroughs as they ramp into high-volume manufacturing. A new trend related to these technologies is the use of curvilinear features on photomasks. Aki... » read more

Survey: 2022 Deep Learning Applications
By eBeam Initiative - 16 Mar, 2022 - Comments: 0

The 2022 member list of deep learning projects and products that eBeam members are working on in photomask to wafer semiconductor manufacturing. Participating companies include Advantest, ASML, Canon, CEA-LETI, D2S, Fraunhofer IPMS, Hitachi High-Tech Corporation, imec, NuFlare Technology, Siemens Industries Software, Inc.; Siemens EDA, STMicroelectronics, and TASMIT. Click here to see the su... » read more

Week In Review: Manufacturing, Test
By Mark LaPedus - 04 Mar, 2022 - Comments: 0

Packaging ASE, AMD, Arm, Google, Intel, Meta, Microsoft, Qualcomm, Samsung, and TSMC have announced the formation of a consortium that will establish a die-to-die interconnect standard and foster an open chiplet ecosystem. The founding companies also ratified the UCIe specification, an open industry standard developed to establish a standard interconnect at the package level. The UCIe 1.0 s... » read more

The Right Project Is Key For Photomask Adoption Of Deep Learning
By Jan Willis - 17 Feb, 2022 - Comments: 0

Deep learning (DL) has become an integral part of the success of many companies. There have been many papers and some reported successes in semiconductor manufacturing, yet only 22% of the luminaries participating in the 2021 eBeam Initiative Luminaries survey see DL as a competitive advantage for photomask making by next year, as shown in figure 1. Looking at that chart, the luminaries believe... » read more

Luminaries See Growth Opportunities For Photomask Writers
By Jan Willis - 20 Jan, 2022 - Comments: 0

Multi-beam mask writers (MBMWs) are the new kid on the block of the photomask writers, so growth predictions aren’t surprising. In fact, 90% of the industry luminaries surveyed by the eBeam Initiative think that new MBMW purchases will increase over the next three years, as shown in figure 1. Looking at that chart, industry luminaries predict sales of new photomask writers to increase across ... » read more

Perspectives On Why EUV Photomasks Are More Expensive
By Jan Willis - 20 Dec, 2021 - Comments: 0

There are fewer photomasks per wafer using EUV lithography, but each EUV photomask is more expensive. Given that, it’s not a surprise that a majority (74%) of industry luminaries surveyed in July say that EUV photomasks will contribute to an increase in photomask revenues for 2021 as shown in figure 1. In a 20-minute video, a panel of experts share their perspectives on what drives EUV photom... » read more

Semiconductor Photomask Revenues Predicted To Increase In 2021
By Jan Willis - 18 Nov, 2021 - Comments: 0

A majority (72%) of industry luminaries surveyed in July predict an increase in photomask revenues for 2021, as shown in figure 1. SEMI also predicts revenues to increase around 9% from $4.4B in 2020 to $4.8B in 2021. In a 12-minute video, a panel of experts share their perspectives on what’s behind the growth trend, how the pandemic has impacted the photomask industry, and how it compares to... » read more

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