tag: etch

Process Variation In The Era Of Scaling: Improving Uniformity With Dummy Fill
By HJ Kim - 21 May, 2026 - Comments: 0

As semiconductor patterning continues to scale, even small layout nonuniformities can lead to noticeably different process outcomes. Real chip layouts contain a mix of dense regions, large open regions, and isolated features. As a result, the etch process encounters different “local environments” across the wafer. Even with the same process settings (or recipe), some areas may etch mo... » read more

TSV Complexity Leads To Manufacturing Bottleneck
By Laura Peters - 22 Apr, 2026 - Comments: 1

Key Takeaways: Through-silicon vias are the biggest enabler of 3D chip stacking and chip-to-PCB connections through silicon interposers. The AI boom is causing HBM and advanced assembly shortages, straining the supply chain. Optimization around etch, fill and reveal help reduce TSV cost. Through-silicon vias (TSVs) provide essential interconnects between DRAM dies inside hig... » read more

Using Virtual Twins To Accelerate The Transition From Layout To Semiconductor Manufacturing
By James Kim - 27 Oct, 2025 - Comments: 0

Standard electronic design automation (EDA) tools can be used to produce a semiconductor layout, which can be used to manufacture a device with targeted performance specifications. Unfortunately, designers have learned from experience that process capabilities on semiconductor manufacturing equipment can limit device yield and performance of any idealized device layout. Even though every... » read more

Research Bits: Feb. 18
By Jesse Allen - 18 Feb, 2025 - Comments: 0

Predicting band gap with neural networks Researchers from Kyoto University developed a machine learning model to predict the band gap of novel semiconductor materials. Using data from almost 2,000 semiconductor materials, the team tested six different neural networks. They found that the incorporation of conditional generative adversarial networks (CGAN) and message passing neural networks ... » read more

Research Bits: Feb. 10
By Jesse Allen - 10 Feb, 2025 - Comments: 0

Speeding up 3D NAND etch Researchers from Lam Research, the University of Colorado Boulder, and Princeton Plasma Physics Laboratory (PPPL) investigated ways to speed up the cryogenic reactive ion etching process for 3D NAND by using a combined hydrogen fluoride gas to create the plasma. “Cryo etch with the hydrogen fluoride plasma showed a significant increase in the etching rate compared... » read more

Using Dummy Patterning To Solve Etch Uniformity Problems
By James Kim - 21 Nov, 2024 - Comments: 0

Semiconductor devices are made up of hundreds of thin layers of materials stacked by multiple deposition and etch processes. Process engineers need to design the best combination of deposition and etch processes to ensure uniformity across an entire chip area and across the silicon wafer. Uniformity is the most common and critical parameter that is monitored in semiconductor fabrication, especi... » read more

Optimizing Wafer Edge Processes For Chip Stacking
By Laura Peters - 23 Sep, 2024 - Comments: 0

Stacking chiplets vertically using short and direct wafer-to-wafer bonds can reduce signal delay to negligible levels, enabling smaller, thinner packages with faster memory/processor speeds and lower power consumption. The race is on to implement wafer stacking and die-to-wafer hybrid bonding, now considered essential for stacking logic and memory, 3D NAND, and possibly multi-layer DRAM stac... » read more

Single Vs. Multi-Patterning Advancements For EUV
By Gregory Haley - 20 Jun, 2024 - Comments: 0

As semiconductor devices become more complex, so do the methods for patterning them. Ever-smaller features at each new node require continuous advancements in photolithography techniques and technologies. While the basic lithography process hasn’t changed since the founding of the industry — exposing light through a reticle onto a prepared silicon wafer — the techniques and technology ... » read more

Understanding CFETs, A Next Generation Transistor Architecture
By Sam Sarkar - 23 May, 2024 - Comments: 0

Computing power has experienced exponential growth over the last 70 years. This has largely been achieved through transistor scaling. Due to a continuous reduction in the size of transistors, engineers have been able to pack more and more of them onto a single chip [1]. This has led to faster, more powerful, and more energy-efficient devices. Improvements in fabrication processes and materials,... » read more

Semiconductor Device Manufacturing Process Challenges And Opportunities
By Andreas Bier - 07 Dec, 2023 - Comments: 0

Semiconductor device manufacturing involves a complex series of processes that transform raw materials into finished devices. The process typically involves four major stages: wafer fabrication, wafer testing, assembly or packaging, and final testing. Each stage has its own unique set of challenges and opportunities. The semiconductor device manufacturing process faces several challenges, inclu... » read more

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