tag: EUV

Making And Protecting Advanced Masks
By Mark LaPedus - 27 Nov, 2019 - Comments: 0

Semiconductor Engineering sat down to discuss lithography and photomask trends with Bryan Kasprowicz, director of technology and strategy and a distinguished member of the technical staff at Photronics; Thomas Scheruebl, director of strategic business development and product strategy at Zeiss; Noriaki Nakayamada, senior technologist at NuFlare; and Aki Fujimura, chief executive of D2S. What fol... » read more

DRAM Scaling Challenges Grow
By Mark LaPedus - 21 Nov, 2019 - Comments: 5

DRAM makers are pushing into the next phase of scaling, but they are facing several challenges as the memory technology approaches its physical limit. DRAM is used for main memory in systems, and today’s most advanced devices are based on roughly 18nm to 15nm processes. The physical limit for DRAM is somewhere around 10nm. There are efforts in R&D to extend the technology, and ultimate... » read more

Inspecting, Patterning EUV Masks
By Mark LaPedus - 06 Nov, 2019 - Comments: 0

Semiconductor Engineering sat down to discuss lithography and photomask trends with Bryan Kasprowicz, director of technology and strategy and a distinguished member of the technical staff at Photronics; Thomas Scheruebl, director of strategic business development and product strategy at Zeiss; Noriaki Nakayamada, senior technologist at NuFlare; and Aki Fujimura, chief executive of D2S. What fol... » read more

Week In Review: Manufacturing, Test
By Mark LaPedus - 25 Oct, 2019 - Comments: 0

Fab tools It’s been a tough period for memory. But is there now a sign of a rebound? For the September 2019 quarter, Lam Research reported revenue of $2.166 billion, and net income was $466 million, or $3.09 per diluted share on a U.S. GAAP basis. The outlook at Lam (LRCX) is a bright spot. “LRCX posted strong results and guidance, noting strength from logic and foundry in the December ... » read more

Mask Making Issues With EUV
By Mark LaPedus - 17 Oct, 2019 - Comments: 0

Semiconductor Engineering sat down to discuss lithography and photomask trends with Bryan Kasprowicz, director of technology and strategy and a distinguished member of the technical staff at Photronics; Thomas Scheruebl, director of strategic business development and product strategy at Zeiss; Noriaki Nakayamada, senior technologist at NuFlare; and Aki Fujimura, chief executive of D2S. What fol... » read more

Week In Review: Manufacturing, Test
By Mark LaPedus - 20 Sep, 2019 - Comments: 0

Fab tools The confidence level of extreme ultraviolet (EUV) lithography continues to grow as the technology moves into production, but the EUV mask infrastructure remains a mixed picture, according to new surveys released by the eBeam Initiative. D2S has developed new hardware and software that enables a long-awaited technology--full-chip masks using inverse lithography technology (ILT). ... » read more

EUV Annual Perceptions Survey – 2019
By eBeam Initiative - 18 Sep, 2019 - Comments: 0

8th Annual Perceptions Survey – 2019 (July) of 68 luminaries across 42 different companies about use of EUV. Confidence in EUV remains high • 73% predict HVM by end of 2020 • Outlook is positive for actinic inspection and pellicle Click here to see survey slides. » read more

Manufacturing Bits: Sept. 17
By Mark LaPedus - 17 Sep, 2019 - Comments: 0

Full-chip inverse lithography D2S has developed new hardware and software that enables a long-awaited technology--full-chip masks using inverse lithography technology (ILT). For years, ILT has been a promising technology. ILT is a next-generation reticle enhancement technique (RET) that enables an optimal photomask pattern for both optical and extreme ultraviolet (EUV) lithography reticles.... » read more

Mixed Picture Seen For EUV Masks
By Mark LaPedus - 16 Sep, 2019 - Comments: 0

The confidence level of extreme ultraviolet (EUV) lithography continues to grow as the technology moves into production, but the EUV mask infrastructure remains a mixed picture, according to new surveys released by the eBeam Initiative. The EUV mask infrastructure involves several technologies that are in various stages of development. On one front, the outlook for several mask tool technol... » read more

Manufacturing Bits: Aug. 27
By Mark LaPedus - 27 Aug, 2019 - Comments: 0

Holographic lithography Switzerland’s Nanotech SWHL GmbH has come out of stealth mode and disclosed its initial technology—a holographic lithography system. Founded in 2015, Nanotech SWHL has developed a sub-wavelength holographic lithography system that generates and prints 3D images on surfaces with one mask at one exposure. Still in R&D, the system is initially targeted for advanced ... » read more

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