tag: Lam Research

Blog Review: Apr. 18
By Jesse Allen - 18 Apr, 2018 - Comments: 0

Cadence's Meera Collier provides an overview of five emerging technologies that could drive the semiconductor industry in the future, from carbon nanotubes to quantum computing. Mentor's Colin Walls reminds embedded software developers of a few common sense tips, including better readability with braces in C/C++ and monitoring stack overflow. Synopsys' Tim Mackey rounds up the last few we... » read more

Blog Review: Apr. 11
By Jesse Allen - 11 Apr, 2018 - Comments: 0

Mentor's Dennis Brophy looks at how the black box nature of IP means it's hard to tell if a block is free from security risks, even if verification IP and open-source design code can help. Synopsys' Sri Deepti Pisipati explains Panel Self Refresh, a power saving mechanism in Display Port that allows for turning off the video processor and its circuitry when an image is static. Cadence's P... » read more

TEL Sells Packaging Tool Unit
By Mark LaPedus - 04 Apr, 2018 - Comments: 0

Tokyo Electron Ltd. (TEL) has signed a definitive agreement to sell its packaging equipment unit, TEL NEXX, to ASM Pacific Technology. With the proposed deal, ASM Pacific enters some new markets. ASM Pacific sells wire bonders, pick-and-place systems, leadframes and other products. Established in 2001, TEL NEXX sells electrochemical deposition (ECD) and physical vapor deposition (PVD) s... » read more

Blog Review: April 4
By Jesse Allen - 04 Apr, 2018 - Comments: 0

Synopsys' Richard Solomon explains PCIe's upstream and downstream component naming and why understanding the perspective is key. Mentor's Cristian Filip dives into frequency domain analysis for high data rate SerDes links and the movement toward a simpler way of channel characterization. Cadence's Paul McLellan takes a look at the history of the RISC processors and the death of microcode ... » read more

What Happened To Nanoimprint Litho?
By Mark LaPedus - 29 Mar, 2018 - Comments: 4

Nanoimprint lithography (NIL) is re-emerging amid an explosion of new applications in the market. Canon, EV Group, Nanonex, Suss and others continue to develop and ship NIL systems for a range of markets. NIL is different than conventional lithography and resembles a stamping process. Initially, a lithographic system forms a pattern on a template based on a pre-defined design. Then, a separa... » read more

Blog Review: Mar. 21
By Jesse Allen - 21 Mar, 2018 - Comments: 0

Mentor's Colin Walls shares five more quick tips for embedded software programming, including t real time systems, programming philosophy, and C++ operator overloading. Cadence's Paul McLellan digs into recently released semiconductor company ratings, the role of memory in shaking up the list, and China's plans for more 3D NAND and DRAM fabs. Synopsys' Taylor Armerding examines the latest... » read more

EUV’s New Problem Areas
By Mark LaPedus - 19 Mar, 2018 - Comments: 2

Extreme ultraviolet (EUV) lithography is moving closer to production, but problematic variations—also known as stochastic effects—are resurfacing and creating more challenges for the long-overdue technology. GlobalFoundries, Intel, Samsung and TSMC hope to insert [gettech id="31045" comment="EUV"] lithography into production at 7nm and/or 5nm. But as before, EUV consists of several compo... » read more

The Week In Review: Manufacturing
By Mark LaPedus - 16 Mar, 2018 - Comments: 0

Chipmakers and OEMs Last month, Arizona approved Google’s Waymo unit to begin testing a commercial self-driving vehicle program. And recently, Waymo released a video showing its first autonomous ride-hailing service. “This development inches us closer than ever to a ‘first-man-on-the-moon’ landmark for Level 5 autonomous transport,” said Derek Viita, an analyst from Strategy Analytic... » read more

How Atomic Layer Deposition Works
By Dennis Hausmann - 15 Mar, 2018 - Comments: 0

Imagine being able to deposit a film of material just a few atomic layers at a time. As impossible as that sounds, atomic layer deposition (ALD) is a reality. In fact, it’s being used in an ever-increasing number of applications as an extremely precise and controllable process for creating thin films. Together with its etch counterpart – atomic layer etching (ALE) – ALD is enabling the us... » read more

DSA Re-Enters Litho Picture
By Mark LaPedus - 15 Mar, 2018 - Comments: 1

By Mark LaPedus and Ed Sperling Directed self-assembly (DSA) is moving back onto the patterning radar screen amid ongoing challenges in lithography. Intel continues to have a keen interest in [gettech id="31046" t_name="DSA"], while other chipmakers are taking another hard look at the technology, according to multiple industry sources. DSA isn't like a traditional [getkc id="80" kc_name="... » read more

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