Blog Review: April 1


Rambus' Steven Woo takes an in-depth look at on-chip memory for high performance AI applications and explores some of the primary differences between HBM and GDDR6. Synopsys' Taylor Armerding warns of the risks of legacy vulnerabilities, where software has problems that were never fixed then forgotten about or never discovered in the first place, and key steps for finding and addressing them... » read more

Blog Review: Mar. 11


Rambus' Steven Woo examines how the upcoming deployment of 5G will enable processing at the edge, and how the edge is getting refined further into the near edge and the far edge with a range of AI solutions across it. A Synopsys writer explains the types of Compute Express Link devices and CXL's unique verification challenges like maintaining the cache coherency between a host CPU and an acc... » read more

2020 IC Outlook: Uncertainty


After a downturn in 2019, the semiconductor and equipment industries looked promising at the start of 2020. In 2019, the downturn was primarily due to the memory markets, namely DRAM and NAND. Both DRAM and NAND saw lackluster demand and falling prices last year. At the start of 2020, though, the memory markets were beginning to recover. Unlike memory, the logic and foundry markets were s... » read more

Blog Review: Feb. 19


Arm's Urmish Thakker takes a look at TinyML, some of the challenges in developing efficient architectures for resource constrained devices, and an explanation of Kronecker product compression. Mentor's Colin Walls considers whether it's better to use single or multiple returns for a function when writing understandable, readable code. Cadence's Paul McLellan shares highlights from a prese... » read more

Blog Review: Jan. 22


Synopsys' Taylor Armerding explains different types of social engineering scams that target everyone from CEOs to gamers to smart appliance users, and what training and tools can better protect people and their organizations. Mentor's Dennis Joseph points to some important things to consider if you're thinking about switching from GDS to OASIS and some tips for converting files. Cadence's... » read more

Blog Review: Jan. 15


Cadence's Paul McLellan looks back at the history of lithography, from its fundamental equation to multiple patterning and the challenges facing EUV today. Synopsys' Taylor Armerding warns that medical device security isn't keeping up with new threats, despite positive steps, due in part to lack of funding, delayed initiatives, and a focus on critical service delivery. In a video, Mentor'... » read more

Can Germany’s Auto Industry Keep Pace?


Germany's strength for the past half-century has been its automotive industry. The big question now is whether that also will become its biggest vulnerability. Challenged on all fronts by fundamental shifts in automotive technology, the German auto industry is struggling to transform itself from precision metal bending to advanced electronics, and so far its future in the face of competitors... » read more

Blog Review: Dec. 18


Lam Research's David Haynes finds that taking advances made at 300mm and applying them via upgrades to 200mm equipment is a cost appropriate strategy to quickly improve yield and add capacity. Synopsys' Taylor Armerding looks at which of this year's many data breaches hit corporate wallets the hardest and how the cost of privacy noncompliance is expected to rise with California's CCPA and st... » read more

Multi-Patterning EUV Vs. High-NA EUV


Foundries are finally in production with EUV lithography at 7nm, but chip customers must now decide whether to implement their next designs using EUV-based multiple patterning at 5nm/3nm or wait for a new single-patterning EUV system at 3nm and beyond. This scenario revolves around ASML’s current extreme ultraviolet (EUV) lithography tool (NXE:3400C) versus a completely new EUV system with... » read more

Blog Review: Dec. 4


Arm's Rupal Gandhi digs into the Cell-Aware Test methodology to deterministically target the growing number of defects that occur within the cells, the process of CAT library generation, and compares the static and transition patterns generated. Cadence's Paul McLellan shares highlights from the recent WOSET event with a look at the big drivers for the current interest in open-source EDA too... » read more

← Older posts