Manufacturing Bits: Sept. 1

Free-electron laser EUV consortium Extreme ultraviolet (EUV) lithography is delayed. Chipmakers hope to insert EUV at the 7nm node, but that’s not a given. As before, the big problem is the EUV light source. So far, the source can’t generate enough power to enable the required throughput for EUV in high-volume production. ASML’s current EUV source is operating at 80 Watts, up from 10 ... » read more

When I Grow Up, I Want To Be A Software Programmer

To keep up with the continuous introduction of new gadgets and capabilities in our smartphones, cars, houses and stores, it is clear that we need more software programmers. That is why multiple companies are coming up with new and innovative ways to introduce people — especially children — to programming. To lure them, the makers of these programming products try to mask the programming asp... » read more