tag: AFM

Research Bits: Dec. 13
By Jesse Allen - 13 Dec, 2022 - Comments: 0

Electronic-photonic interface for data centers Engineers at Caltech and the University of Southampton integrated an electronic and photonic chip for high-speed communication in data centers. "There are more than 2,700 data centers in the U.S. and more than 8,000 worldwide, with towers of servers stacked on top of each other to manage the load of thousands of terabytes of data going in and o... » read more

Metrology Of Thin Resist For High NA EUVL
By Nova - 16 Nov, 2022 - Comments: 0

One of the many constrains of high numerical aperture extreme ultraviolet lithography (High NA EUVL) is related to resist thickness. In fact, one of the consequences of moving from current 0.33NA to 0.55NA (high NA) is the depth of focus (DOF) reduction. In addition, as the resist feature lines shrink down to 8nm half pitch, it is essential to limit the aspect ratio to avoid pattern collapse. T... » read more

Deep Learning To Classify And Establish Structure Property Predictions With PeakForce QNM Atomic Force Microscopy
By Bruker - 07 Sep, 2022 - Comments: 0

Machine learning and specifically, deep learning, is a powerful tool to establish the presence (or absence) of microstructure correlations to bulk properties with its ability to flesh out relationships and trends that are difficult to establish otherwise. This application note discusses the use of deep learning tools, to explore AFM phase and PeakForce Quantitative Nanomechanics (QNM) im... » read more

Particle Removal From EUV Photomasks
By Technical Paper Link - 31 Aug, 2022 - Comments: 0

This technical paper titled "AFM-Based Hamaker Constant Determination with Blind Tip Reconstruction" was just published by researchers at ASML, RWTH Aachen University, and AMO GmbH. The research reports a vaccuum AFM-based approach for particle removal from EUV photomasks. Find the technical paper here. Published August 2022. Ku, B., van de Wetering, F., Bolten, J., Stel, B., van de K... » read more

Nanosheet FETs Drive Changes In Metrology And Inspection
By Karen Heyman - 09 Aug, 2022 - Comments: 0

In the Moore’s Law world, it has become a truism that smaller nodes lead to larger problems. As fabs turn to nanosheet transistors, it is becoming increasingly challenging to detect line-edge roughness and other defects due to the depths and opacities of these and other multi-layered structures. As a result, metrology is taking even more of a hybrid approach, with some well-known tools moving... » read more

E-beam’s Role Grows For Detecting IC Defects
By Karen Heyman - 12 Jul, 2022 - Comments: 1

The perpetual march toward smaller features, coupled with growing demand for better reliability over longer chip lifetimes, has elevated inspection from a relatively obscure but necessary technology into one of the most critical tools in fab and packaging houses. For years, inspection had been framed as a battle between e-beam and optical microscopy. Increasingly, though, other types of insp... » read more

FEOL Nanosheet Process Flow & Challenges Requiring Metrology Solutions (IBM Watson)
By Technical Paper Link - 08 Jul, 2022 - Comments: 0

New technical paper titled "Review of nanosheet metrology opportunities for technology readiness," from researchers at IBM Thomas J. Watson Research Ctr. (United States). Abstract (partial): "More than previous technologies, then, nanosheet technology may be when some offline techniques transition from the lab to the fab, as certain critical measurements need to be monitored in real time. T... » read more

Atomic Force Microscopy Covers The Landscape Of Polymer Characterization
By Bruker - 07 Jun, 2022 - Comments: 0

"Materials scientists designing a polymer-based material for a specific application must analyze how and why all these factors come together to impact the final product. Understanding the structure and properties at the microscopic level is critical to a complete understanding of the material. “Everybody wants to make their materials perform better at the macroscale,” says Bede Pittenger, a... » read more

Improving Atomic Force Microscopy (AFM)
By Technical Paper Link - 17 May, 2022 - Comments: 0

Research paper "Enhancing sensitivity in atomic force microscopy for planar tip-on-chip probes" from Eindhoven University of Technology, Lorraine University and DRF/IRAMIS/SPEC-LEPO, Centre CEA de Saclay. Abstract "We present a new approach to tuning-fork-based atomic force microscopy for utilizing advanced “tip-on-chip” probes with high sensitivity and broad compatibility. Usually, s... » read more

Strategies For Faster Yield Ramps On 5nm Chips
By Laura Peters - 12 Apr, 2022 - Comments: 0

Leading chipmakers TSMC and Samsung are producing 5nm devices in high volume production and TSMC is forging ahead with plans for first 3nm silicon by year end. But to meet such aggressive targets, engineers must identify defects and ramp yield faster than before. Getting a handle on EUV stochastic defects — non-repeating patterning defects such as microbridges, broken lines, or missing con... » read more

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