tag: finFETs

Executive Insight: Wally Rhines
By Ed Sperling - 01 Jul, 2015 - Comments: 0

Wally Rhines, chairman and CEO of Mentor Graphics, sat down with Semiconductor Engineering to talk about what's changing across a wide swath of the industry, where the new opportunities will be, when security will become a real opportunity for EDA, and why Moore's Law will die but progress will continue forever. SE: Looking back over the past year, what's changed and where are the possible r... » read more

Litho Challenges Break The Design-Process Wall
By Katherine Derbyshire - 22 Jun, 2015 - Comments: 3

The days when chip designers could throw tape “over the wall” to the manufacturing side are long gone. Over the last several technology generations, increasingly restrictive process kits have forced designers to accommodate their circuit structures to the manufacturing process. Lacking a successor to 193nm lithography, the industry has turned to increasingly complex resolution enhancemen... » read more

Foundries Expand Planar Efforts
By Mark LaPedus - 18 Jun, 2015 - Comments: 0

Competition is heating up in the leading-edge foundry business, as vendors begin to ramp up their new 16nm/14nm finFET processes. But that’s not the only action in the foundry arena. They are also expanding their efforts in the leading-edge planar market by rolling out new 28nm and 22nm processes. On one front, TSMC is offering new 28nm variants, based on bulk CMOS technology. And on an... » read more

Getting Over Overlay
By Mark LaPedus - 18 Jun, 2015 - Comments: 0

Chipmakers continue to migrate to the next node, but there are signs that traditional IC scaling is slowing down. So what’s causing the slowdown? Or for that matter, what could ultimately undo [getkc id="74" comment="Moore's Law"]? It could be a combination of factors. To be sure, IC design costs and complexity are soaring at each node. Scaling challenges are also playing a role. And ov... » read more

FinFET And Multi-Patterning Aware Place And Route Implementation
By Mentor, a Siemens Business - 18 Jun, 2015 - Comments: 0

The use of finFETs and multi-patterning has a huge impact on the entire physical implementation flow. This paper outlines the new challenges in placement, routing, optimization, and physical verification and describes how the Olympus-SoC place and route system handles them. To read more, click here. » read more

3 Ways To Reload Moore’s Law
By Michael Watts - 18 Jun, 2015 - Comments: 1

The electronics revolution has been enabled because the cost and power per transistor has decreased 30% per year for the last 30 years — a fact usually associated with Moore's Law. This has been accomplished by simply reducing the transistor size while offsetting increased costs of equipment and mask levels, and by increased productivity from improved yield, throughput and wafer size. This... » read more

Managing Dynamic Power
By Ann Mutschler - 16 Jun, 2015 - Comments: 0

Working with finFETs is a study in contrasts. While leakage is now under control for the first time in several process generations due to the advent of different gate technology, dynamic power density caused by tightly packed transistors and higher clock speeds has become the big issue. “FinFET technology helps with reducing static/leakage power so when your logic is not active, you can sh... » read more

SoC Integration Headaches Grow
By Ed Sperling - 16 Jun, 2015 - Comments: 0

As the number of IP blocks grows, so do the headaches of integrating the various pieces and making sure they perform as planned within a prescribed power envelope. This is easier said than done, particularly at the most advanced process nodes. There are more blocks, more power domains, more states and use-model dependencies, and there is much more contention for memories. There are physical ... » read more

DAC 2015: Day 3
By Brian Bailey - 10 Jun, 2015 - Comments: 0

The schedule for today revolves around eating and it is perfectly balanced between the big three. The morning starts with breakfast for the Cadence panel titled "Crossing the Great Divide: How to Safely Navigate the move from 28nm to 16FF+." The panel was moderated by Brian Fuller and panelists included Jayanta Lahiri from ARM, Afshin Montaz from Broadcom, Scott McCormack from Freescale, Yan... » read more

What’s Different At 16/14nm?
By Ed Sperling - 28 May, 2015 - Comments: 0

Will finFETs live up to their promise? It depends on whom you ask, when you ask that question, and the intended application of a design. But across the semiconductor industry, there is general agreement that it's getting easier to work at the most advanced nodes as tools and flows are better understood and overall experience increases. There is no question that [getkc id="185" kc_name="finFE... » read more

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