tag: interconnects

How Reliable Are Interconnects In 16nm FinFET Designs?
By Arvind Vel - 05 Dec, 2013 - Comments: 0

The 16nm FinFET process node is rapidly becoming the preferred choice for advanced Integrated Circuit (IC) designs. The 16nm node’s lower standby leakage characteristics and increased drive strength capability enable IC designers to push the boundaries of low power – high performance designs. However, the choice of the node is also accompanied by reduced reliability margins, requiring desig... » read more

The Upside Of Through-Silicon Vias
By Katherine Derbyshire - 17 Oct, 2013 - Comments: 0

Through-silicon vias (TSVs) for 3D integration are superficially similar to damascene copper interconnects for integrated circuits. Both etch the via, into either silicon or a dielectric, line it with a barrier against copper diffusion, then deposit a seed layer prior to filling the via with copper using some form of aqueous deposition. In both processes, the integrity of the diffusion barrier ... » read more

Tackling Verification Challenges With Interconnect Validation Tool
By Various Writers - 17 Oct, 2013 - Comments: 0

An interconnect, also referred to as a bus matrix or fabric, serves as the communication hub of multiple intellectual property (IP) cores inside a system on chip (SoC). As the capacity of today’s SoCs continues to increase dramatically, interconnect verification complexity also grows, considering the master/slave numbers, various protocols, different kinds of transactions, and multi-layered t... » read more

ATE Market Changes With The Times
By Jeff Chappell - 15 Aug, 2013 - Comments: 0

By Jeff Chappell A declining PC market in recent years coupled with the continuing growth of mobile phones and tablets has meant changes throughout the semiconductor supply chain, and automated test equipment is no exception. For example, a decade ago memory test—namely DRAM—was a large market compared with that of nascent system-on-a-chip (SoC) testing. In fact, at the time some test e... » read more

Experts At The Table: Performance Analysis
By Ed Sperling - 02 Aug, 2013 - Comments: 0

By Ed Sperling Low-Power/High-Performance Engineering sat down with Ravi Kalyanaraman, senior verification manager for the digital entertainment business unit at Marvell; William Orme, strategic marketing manager for ARM’s System IP and Processor Division; Steve Brown, product marketing and business development director for the systems and software group at Cadence; Johannes Stahl director o... » read more

Manufacturing Bits: July 16
By Mark LaPedus - 16 Jul, 2013 - Comments: 0

Photon Chips Harvard University, the Massachusetts Institute of Technology (MIT) and the Vienna University of Technology have devised an all-optical transistor controlled by a single photon. The optical transistor could enable the development of photonic quantum gates and deterministic multi-photon entanglement. For years, researchers have been looking to develop an optical transistor, whe... » read more

Extending Copper Interconnect Beyond The 14nm Node
By Various Writers - 20 Jun, 2013 - Comments: 0

Fabricating interconnects is one of the most process-intensive and cost-sensitive parts of manufacturing. To find out more about what's changing in this area and why it's so important, click here. » read more

Executive Briefing: Wally Rhines
By Ed Sperling - 28 Mar, 2013 - Comments: 0

By Ed Sperling System-Level Design, as part of its ongoing executive briefing series, sat down with Wally Rhines, Mentor Graphics' chairman and CEO, to talk about future problems, opportunities, and the gray areas that could go either way. What follows are excerpts of that conversation. SLD: Is the amount of time spent on verification increasing? Rhines: It depends on how you define who s... » read more

Nanoscale Wiring
By Kathryn Ta - 21 Mar, 2013 - Comments: 0

By Kathryn Ta The TEM image (below) taken at Applied Materials’ Maydan Technology Center shows a series of 20nm-wide trenches in cross section. These tiny structures – about 1/5000th of the diameter of an average human hair – are similar to the interconnects used to wire the billions of transistors in next-generation microchips. You can see that each trench is partially filled with coppe... » read more

What Will Replace Dual Damascene?
By Mark LaPedus - 24 Jan, 2013 - Comments: 0

By Mark LaPedus In the mid-1990s, IBM announced the world’s first devices using a copper dual damascene process. At the time, the dual damascene manufacturing process was hailed as a major breakthrough. The new copper process enabled IC makers to scale the tiny interconnects in a device, as the previous material, aluminum, faced some major limitations. Dual damascene remains the workhorse... » read more

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