tag: interconnects

New Materials Era In Advanced Interconnects
By Kavita Shah - 15 May, 2014 - Comments: 0

By Kavita Shah Growth in semiconductors today is driven primarily by mobile applications and this demand continues to increase with no slowdown in sight. Supporting this trend, chipmakers continue adding smaller and faster transistors to chips to maintain the pace of Moore’s Law, and as a consequence copper wiring is being drastically scaled and densities increased. Today advanced chips c... » read more

Atomic Layer Etch Finally Emerges
By Mark LaPedus - 15 May, 2014 - Comments: 1

The migration towards finFETs and other devices at the 20nm node and beyond will require a new array of chip-manufacturing technologies. Multiple patterning, hybrid metrology and newfangled interconnect schemes are just a few of the technologies required for future scaling. In addition, the industry also will require new techniques that can process structures at the atomic level. For example... » read more

The Bumpy Road To FinFETs
By Mark LaPedus - 15 May, 2014 - Comments: 2

The shift from planar transistors to finFETs is a major inflection point in the IC industry. FinFETs are expected to enable higher performance chips at lower voltages. And the next-generation transistor technology also could allow the industry to extend CMOS to the 10nm node and perhaps beyond. But as it turns out, finFET technology is also harder to master than previously thought. For exam... » read more

Interconnect Challenges Grow
By Mark LaPedus - 20 Feb, 2014 - Comments: 0

Qualcomm outlined the technology challenges facing mobile chip suppliers at a recent event. In no particular order, the challenges include the usual suspects—area scaling, power reduction, performance and cost. Another concern for Qualcomm is an often-overlooked part of the equation—the backend-of-the-line (BEOL). In chip production, the BEOL is where the interconnects are formed within ... » read more

Manufacturing Bits: Jan. 21
By Mark LaPedus - 21 Jan, 2014 - Comments: 1

Redefining The Kilogram In 2011, the General Conference on Weights and Measures approved a plan to redefine the kilogram and other measurement units. The new definition for the kilogram will be based on the fixed numerical values of Planck’s constant (h), according to the National Institute of Standards and Technology (NIST), part of the U.S. Department of Commerce. NIST has taken steps t... » read more

Blog Review: Dec. 11
By Ed Sperling - 11 Dec, 2013 - Comments: 0

Synopsys’ Brent Gregory has developed a career growth checklist for computer science majors. They should hang this in the hallway at universities. Cadence’s Brian Fuller interviews Saar Drimer, a UK hardware engineer who has been experimenting with odd-shaped PCBs. According to Drimer, 45-degree angles aren’t always optimal. But what happens to all the expensive tools everyone has bee... » read more

3D-IC Requires Expanded Power Grid Analysis
By Christen Decoin - 05 Dec, 2013 - Comments: 0

At advanced nodes, effective power grid analysis is critical to ensure that the small dimension interconnects can handle current demands without introducing potential failure modes or signal integrity issues. Existing software tools for power analysis need to be extended and enhanced for 2.5D and 3D designs to fulfill new requirements and use models. This article describes some of the needed im... » read more

How Reliable Are Interconnects In 16nm FinFET Designs?
By Arvind Vel - 05 Dec, 2013 - Comments: 0

The 16nm FinFET process node is rapidly becoming the preferred choice for advanced Integrated Circuit (IC) designs. The 16nm node’s lower standby leakage characteristics and increased drive strength capability enable IC designers to push the boundaries of low power – high performance designs. However, the choice of the node is also accompanied by reduced reliability margins, requiring desig... » read more

The Upside Of Through-Silicon Vias
By Katherine Derbyshire - 17 Oct, 2013 - Comments: 0

Through-silicon vias (TSVs) for 3D integration are superficially similar to damascene copper interconnects for integrated circuits. Both etch the via, into either silicon or a dielectric, line it with a barrier against copper diffusion, then deposit a seed layer prior to filling the via with copper using some form of aqueous deposition. In both processes, the integrity of the diffusion barrier ... » read more

Tackling Verification Challenges With Interconnect Validation Tool
By Various Writers - 17 Oct, 2013 - Comments: 0

An interconnect, also referred to as a bus matrix or fabric, serves as the communication hub of multiple intellectual property (IP) cores inside a system on chip (SoC). As the capacity of today’s SoCs continues to increase dramatically, interconnect verification complexity also grows, considering the master/slave numbers, various protocols, different kinds of transactions, and multi-layered t... » read more

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