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EUV Challenges And Unknowns At 3nm and Below


The chip industry is preparing for the next phase of extreme ultraviolet (EUV) lithography at 3nm and beyond, but the challenges and unknowns continue to pile up. In R&D, vendors are working on an assortment of new EUV technologies, such as scanners, resists, and masks. These will be necessary to reach future process nodes, but they are more complex and expensive than the current EUV pro... » read more

COVID-19 Tech Bits


Tech companies, consortiums and universities are jumping in to help fight COVID-19, deploying everything from massive computing capabilities to developing new technologies that can protect medical workers and first responders. Nearly all of these have ramped up over the past several weeks, as the tech world begins to take on a global challenge to combat the deadly virus. Compute resources... » read more

Week In Review: Design, Low Power


Intel disclosed a speculative execution side-channel attack method called L1 Terminal Fault (L1TF). Leslie Culbertson, Intel's executive vice president and general manager of Product Assurance and Security, writes: "This method affects select microprocessor products supporting Intel Software Guard Extensions (Intel SGX) and was first reported to us by researchers at KU Leuven University, Techni... » read more