tag: quadruple patterning

N7 FinFET Self-Aligned Quadruple Patterning Modeling
By Coventor - 16 Dec, 2019 - Comments: 0

In this paper, we model fin pitch walk based on a process flow simulation using the Coventor SEMulator3D virtual platform. A taper angle of the fin core is introduced into the model to provide good agreement with silicon data. The impact on various Self-Aligned Quadruple Patterning process steps is assessed. Etch sensitivity to pattern density is reproduced in the model and provides insight on ... » read more

Where Is Next-Gen Lithography?
By Mark LaPedus - 31 Mar, 2016 - Comments: 2

Semiconductor Engineering sat down to discuss lithography and photomask technologies with Greg McIntyre, director of the Advanced Patterning Department at [getentity id="22217" comment="Imec"]; Harry Levinson, senior fellow and senior director of technology research at [getentity id="22819" comment="GlobalFoundries"]; Uday Mitra, vice president and head of strategy and marketing for the Etch Bu... » read more

Where Is Next-Gen Lithography?
By Mark LaPedus - 17 Mar, 2016 - Comments: 4

Semiconductor Engineering sat down to discuss lithography and photomask technologies with Greg McIntyre, director of the Advanced Patterning Department at [getentity id="22217" comment="Imec"]; Harry Levinson, senior fellow and senior director of technology research at [getentity id="22819" comment="GlobalFoundries"]; Uday Mitra, vice president and head of strategy and marketing for the Etch Bu... » read more

Resetting Expectations On Multi-Patterning Decomposition And Checking
By David Abercrombie - 17 Dec, 2015 - Comments: 0

As I said in Part 1 of this topic, it never ceases to amaze me how much confusion and misunderstanding there is when it comes to multi-patterning (MP) decomposition and checking. That entire first article only focused on the typical subjects I’ve had to discuss with customers regarding double-patterning (DP). I have to tell you that with the deployment of triple-patterning (TP) and quadruple-... » read more

Resetting Expectations On Multi-Patterning Decomposition And Checking
By David Abercrombie - 22 Oct, 2015 - Comments: 0

It never ceases to amaze me how much confusion and misunderstanding there is when it comes to multi-patterning (MP) decomposition and checking. I sometimes forget just how new a topic it is in our industry. Because of this short-lived history, and the limited time designers have had to acquire any detailed understanding of its complexity, there appears to be some serious disconnect in expectati... » read more

EUV: Cost Killer Or Savior?
By Katherine Derbyshire - 17 Sep, 2015 - Comments: 4

Moore’s Law, the economic foundation of the semiconductor industry, states that transistor density doubles in each technology generation, at constant cost. As IMEC’s Arindam Mallik explained, however, the transition to a new technology node is not a single event, but a process. Typically, when the new technology is first introduced, it brings a 20% to 25% wafer cost increase. Process opt... » read more

Tech Talk: 10nm Patterning
By Brian Bailey - 20 Aug, 2015 - Comments: 0

David Abercrombie, advanced physical verification methodology program manager at Mentor Graphics, talks about triple and quadruple patterning after 20/16/14nm and what design teams need to understand to get this right. [youtube vid=7bjutPWakpw] » read more

Inside Samsung’s Foundry Biz
By Mark LaPedus - 23 Jul, 2015 - Comments: 0

Semiconductor Engineering sat down to talk about the foundry business, process technology, design and other topics with Hong Hao, senior vice president of the foundry business at [getentity id="22865" e_name="Samsung Semiconductor"]; and Kelvin Low, senior director of foundry marketing at Samsung Semiconductor. What follows are excerpts of that discussion. SE: The foundry business has alway... » read more

One-On-One: Thomas Caulfield
By Mark LaPedus - 21 May, 2015 - Comments: 0

Semiconductor Engineering sat down to talk about fabs, process technology and the equipment industry with Thomas Caulfield, senior vice president and general manager of Fab 8 at [getentity id="22819" comment="GlobalFoundries"]. Located in Saratoga County, N.Y., Fab 8 is GlobalFoundries’ most advanced 300mm wafer fab. What follows are excerpts of that discussion. SE: Last year, GlobalFoundr... » read more

Big Changes At 10nm And Beyond
By Ed Sperling - 16 Apr, 2015 - Comments: 0

The move to 16/14nm finFETs is relatively straightforward. The move to 10nm and 7nm will be quite different. While double patterning with colors at 16/14nm has a rather steep learning curve, reports from chipmakers developing advanced chips is the technology and methodologies are manageable once engineering teams begin working with it. The hardest part is visualizing how different parts will... » read more

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