tag: yield

Variation’s Long, Twisty Tail Worsens At 7/5nm
By Ed Sperling - 20 Sep, 2018 - Comments: 1

Variation is becoming a bigger challenge at each new node, but not just for obvious reasons and not always from the usual sources. Nevertheless, dealing with these issues takes additional time and resources, and it can affect the performance and reliability of those chips throughout their lifetimes. At a high level, variation historically was viewed as a mismatch between what design teams in... » read more

Process Corner Explosion
By Ann Mutschler - 13 Sep, 2018 - Comments: 1

The number of corners that need to be checked is exploding at 7nm and below, fueled by everything from temperature and voltage to changes in metal. Lowering risk and increasing predictability of an SoC at those nodes starts with understanding what will happen when a design is manufactured on a particular foundry process, captured in process corners. This is basically a way of modeling what i... » read more

3D NAND Flash Wars Begin
By Mark LaPedus - 20 Aug, 2018 - Comments: 0

3D NAND suppliers are gearing up for a new battle amid a period of price and competitive pressures, racing each other to the next technology generations. Competition is intensifying as a new player enters the 3D NAND market—China’s Yangtze Memory Technologies Co. (YMTC). Backed by billions of dollars in funding from the Chinese government, YMTC recently introduced its first 3D NAND techn... » read more

Estimating MOSFET Leakage From Low-Cost, Low-Resolution Fast Parametric Test
By PDF Solutions - 19 Jul, 2018 - Comments: 0

A method of estimating the subthershold component of MOSFET off-state current (Ioffs) using low-cost, low-resolution fast parallel parametric test is introduced. This method measures the subthreshold slope and uses it to estimate Ioffs. Measurements of individual transistors show a very good agreement between measured Ioffs and Ioffs estimated using our approach. For a simple pad-efficient tran... » read more

Defect Reduction At 7/5nm
By Ed Sperling - 12 Jul, 2018 - Comments: 0

Darin Collins, director of metrology at Brewer Science, talks about the cause of defects at advanced nodes and how material purity increasingly plays a role in overall quality and yield. » read more

Dealing With Resistance In Chips
By Mark LaPedus - 21 Jun, 2018 - Comments: 2

Chipmakers continue to scale the transistor at advanced nodes, but they are struggling to maintain the same pace with the other two critical parts of the device—the contacts and interconnects. That’s beginning to change, however. In fact, at 10nm/7nm, chipmakers are introducing new topologies and materials such as cobalt, which promises to boost the performance and reduce unwanted resist... » read more

Advanced 3D Design Technology Co-Optimization For Manufacturability
By Yu De Chen - 30 Apr, 2018 - Comments: 0

By Yu De Chen, Jacky Huang, Dalong Zhao, Jiangjiang (Jimmy) Gu, and Joseph Ervin Yield and cost have always been critical factors for both manufacturers and designers of semiconductor products. It is a continuous challenge to meet targets of both yield and cost, due to new device structures and the increasing complexity of process innovations introduced to achieve improved product performanc... » read more

The Next 5 Years Of Chip Technology
By Ed Sperling - 14 Mar, 2018 - Comments: 0

Semiconductor Engineering sat down to discuss the future of scaling, the impact of variation, and the introduction of new materials and technologies, with Rick Gottscho, CTO of Lam Research; Mark Dougherty, vice president of advanced module engineering at GlobalFoundries; David Shortt, technical fellow at KLA-Tencor; Gary Zhang, vice president of computational litho products at ASML; and Shay... » read more

7/5nm Timing Closure Intensifies
By Ann Mutschler - 25 Jan, 2018 - Comments: 1

Timing closure issues are increasing in magnitude at 7/5nm, and ones that were often considered minor in the past no longer can be ignored. Timing closure is an essential part of any chip design. The process ensures that all combinatorial paths through a design meet the necessary timing so that it can run reliably at a specified clock rate. Timing closure hasn't changed significantly over th... » read more

Pattern-Based Analytics To Estimate And Track Yield Risk Of Designs Down To 7nm
By Cadence - 24 Jan, 2018 - Comments: 0

Topological pattern-based methods for analyzing IC physical design complexity and scoring resulting patterns to identify risky patterns have emerged as powerful tools for identifying important trends and comparing different designs. In this paper, previous work is extended to include analysis of layouts designed for the 7nm technology generation. A comparison of pattern complexity trends with r... » read more

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