A new technical paper titled "Enhancing Cu-barrier properties of 2D-WS2 barriers: The role of grain size and surface passivation" was published by researchers at National University of Singapore, AIXTRON, IMiF and Applied Materials.
Abstract
"Two-dimensional (2D) films, such as tungsten disulfide (WS2), are being considered by the microelectronics industry as promising barrier and liner s...
» read more