A new technical paper titled “Efficient and stable activation by microwave annealing of nanosheet silicon doped with phosphorus above its solubility limit” was just published by researchers at National Taiwan University, Cornell University, TSMC, University of Valladolid, DSG Technologies, National Central University and National Yang Ming Chiao Tung University.
A modified microwave was used for ” proper activation of the dopants without excessive heating or damage of the silicon crystal,” according to Cornell University’s news release.
Find the technical paper here. Published August 2022.
Chun-Hsiung Tsai, Chandrashekhar P. Savant, Mohammad Javad Asadi, Yu-Ming Lin, Ivan Santos, Yu-Hsiang Hsu, Jeffrey Kowalski, Lourdes Pelaz, Wei-Yen Woon, Chih-Kung Lee, and James C. M. Hwang , “Efficient and stable activation by microwave annealing of nanosheet silicon doped with phosphorus above its solubility limit”, Appl. Phys. Lett. 121, 052103 (2022) https://doi.org/10.1063/5.0099083.
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