Why Investments At Advanced Nodes Matter

By Ed Sperling - 18 Sep, 2014 - Comments: 0

Despite all the talk about rising costs of development, uncertainties about lithography and talk about the death of Moore’s Law, a record number of companies are developing chips at 16nm/14nm. That may sound surprising, but asking why that’s happening is probably the wrong question. The really critical question is what they’re going to do with those chips. What’s become quite evident... » read more

Making Chips Run Faster

By Ed Sperling - 11 Sep, 2014 - Comments: 3

For all the talk about low power, the real focus of most chipmakers is still performance. The reality is that OEMs might be willing to sacrifice increasing performance for longer battery life, but they will rarely lower performance to reach that goal. This is more obvious for some applications than others. A machine monitor probably isn’t the place where performance will make much of a dif... » read more

The Changing IP Ecosystem

By Ann Mutschler - 21 Aug, 2014 - Comments: 0

Is a larger [getkc id="43" kc_name="IP"] company better suited to deliver what users need – from hardware to software to PDKs and reference designs – with larger and more diverse teams to draw upon, as well as deep foundry relationships? Or does it pay to small, quick and nimble? The answer to that question appears to be playing out in real time. As design complexity has increased, so ha... » read more

More Than Moore

By Ed Sperling - 21 Aug, 2014 - Comments: 0

Semiconductor Engineering sat down to discuss the value of feature shrinks and what comes next with Steve Eplett, design technology and automation manager at Open-Silicon; Patrick Soheili, vice president and general manager of IP Solutions at eSilicon; Brandon Wang, engineering group director at Cadence; John Ferguson, product manager for DRC applications at Mentor Graphics; and Kevin Kranen, d... » read more

Signoff Intensity On The Rise

By The SE Staff - 15 Aug, 2014 - Comments: 2

By Ann Steffora Mutschler and Ed Sperling Lithography and signoff are crossing swords at 16/14nm and 10nm, creating new problems that raise questions about just how confident design teams will be when they sign off before tapeout — and how many respins are likely to follow. While designs at 20nm, 16nm and 14nm typically rely on colorless double patterning, at 10nm colors are mandatory. ... » read more

What’s Next For Memory?

By Mark LaPedus - 14 Aug, 2014 - Comments: 4

Apple, Samsung and others are developing the next wave of smartphones and tablets. OEMs want to integrate new memory schemes that provide more bandwidth at lower power. But there are some challenges in the arena that are prompting memory makers to rethink their mobile DRAM roadmaps. The conventional wisdom was that memory makers would ship mobile DRAMs based on the new LPDDR4 interface stand... » read more

Executive Insight: Taher Madraswala

By Ed Sperling - 11 Aug, 2014 - Comments: 1

Semiconductor Engineering sat down with Taher Madraswala, president of Open-Silicon, to talk about future challenges, opportunities and changes. What follows are excerpts of that interview. SE: What worries you most? Madraswala: What worries me at the industry-level is the growing effect that business constraints are having on product innovation. We’ve done a very good job of advancing ... » read more

IP Integration Challenges Rising

By Ann Mutschler - 24 Jul, 2014 - Comments: 0

It’s not just [getkc id="80" comment="lithography"] that is putting a crimp in sub-28nm designs. As more functions, features, transistors and software are added onto chips, the pressure to get chips out the door has forced chipmakers to lean more heavily on third-party IP providers. Results, as you might expect, have been mixed. The number of blocks has mushroomed, creating its own web of ... » read more

What Is A Technology Node, Anyway?

By Katherine Derbyshire - 17 Jul, 2014 - Comments: 0

The idea of clearly defined “technology nodes” has been more theoretical than practical for quite some time now. Electrostatic and power consumption considerations have long made it difficult to scale transistor dimensions at the same rate as memory density. Meanwhile, lithography has become more and more challenging, particularly for the arbitrary patterns commonly seen in logic design. ... » read more

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tag: 20nm

Why Investments At Advanced Nodes Matter

Making Chips Run Faster

More Problems Ahead

The Changing IP Ecosystem

More Than Moore

Signoff Intensity On The Rise

What’s Next For Memory?

Executive Insight: Taher Madraswala

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