tag: 3nm

Variation Threat In Advanced Nodes, Packages Grows
By Ed Sperling - 21 Dec, 2020 - Comments: 0

Variation is becoming a much bigger and more complex problem for chipmakers as they push to the next process nodes or into increasingly dense advanced packages, raising concerns about the functionality and reliability of individual devices, and even entire systems. In the past, almost all concerns about variation focused on the manufacturing process. What printed on a piece of silicon didn't... » read more

AI And High-NA EUV At 3/2/1nm
By Mark LaPedus - 16 Dec, 2020 - Comments: 1

Semiconductor Engineering sat down to discuss lithography and photomask issues with Bryan Kasprowicz, director of technology and strategy and a distinguished member of the technical staff at Photronics; Harry Levinson, principal at HJL Lithography; Noriaki Nakayamada, senior technologist at NuFlare; and Aki Fujimura, chief executive of D2S. What follows are excerpts of that conversation. To vie... » read more

Predicting Reliability At 3/2nm And Beyond
By Ed Sperling - 08 Dec, 2020 - Comments: 0

The chip industry is determined to manufacture semiconductors at 3/2nm — and maybe even beyond — but it's unlikely those chips will be the complex all-in-one SoCs that have defined advanced electronics over the past decade or so. Instead, they likely will be one of many tiles in a system that define different functions, the most important of which are highly specialized for a particular app... » read more

EUV Challenges And Unknowns At 3nm and Below
By Mark LaPedus - 19 Nov, 2020 - Comments: 1

The chip industry is preparing for the next phase of extreme ultraviolet (EUV) lithography at 3nm and beyond, but the challenges and unknowns continue to pile up. In R&D, vendors are working on an assortment of new EUV technologies, such as scanners, resists, and masks. These will be necessary to reach future process nodes, but they are more complex and expensive than the current EUV pro... » read more

What’s Next In AI, Chips And Masks
By Mark LaPedus - 19 Nov, 2020 - Comments: 0

Aki Fujimura, chief executive of D2S, sat down with Semiconductor Engineering to talk about AI and Moore’s Law, lithography, and photomask technologies. What follows are excerpts of that conversation. SE: In the eBeam Initiative’s recent Luminary Survey, the participants had some interesting observations about the outlook for the photomask market. What were those observations? Fujimur... » read more

Rethinking The Scaling Mantra
By Ed Sperling - 26 Oct, 2020 - Comments: 0

What makes a new chip better than a previous version, or a competitor's version, has been changing for some time. In most cases the key metrics are still performance and power, but what works for one application or use case increasingly is different from another. Advancements are rarely tied just to process nodes these days. Even the most die-hard proponents of Moore's Law recognize that the... » read more

Regaining The Edge In U.S. Chip Manufacturing
By Mark LaPedus & Ann Steffora Mutschler - 26 Oct, 2020 - Comments: 16

The United States is developing new strategies to prevent it from falling further behind Korea, Taiwan, and perhaps even China in semiconductor manufacturing, as trade tensions and national security concerns continue to grow. For years, the U.S. has been a leader in the development of new chip products like GPUs and microprocessors. But from a chip manufacturing standpoint, the U.S. is losin... » read more

Productivity Keeping Pace With Complexity
By Brian Bailey - 24 Sep, 2020 - Comments: 0

Designs have become larger and more complex and yet design time has shortened, but team sizes remain essentially flat. Does this show that productivity is keeping pace with complexity for everyone? The answer appears to be yes, at least for now, for a multitude of reasons. More design and IP reuse is using more and larger IP blocks and subsystems. In addition, the tools are improving, and mo... » read more

Custom Designs, Custom Problems
By Ed Sperling - 16 Sep, 2020 - Comments: 0

Semiconductor Engineering sat down to discuss power optimization with Oliver King, CTO at Moortec; João Geada, chief technologist at Ansys; Dino Toffolon, senior vice president of engineering at Synopsys; Bryan Bowyer, director of engineering at Mentor, a Siemens Business; Kiran Burli, senior director of marketing for Arm's Physical Design Group; Kam Kittrell, senior product management group d... » read more

Challenges At 3/2nm
By Ed Sperling - 15 Sep, 2020 - Comments: 0

David Fried, vice president of computational products at Lam Research, talks about issues at upcoming process nodes, the move to EUV lithography and nanosheet transistors, and how process variation can affect yield and device performance. » read more

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