tag: Coventor

The Effects Of Poly Corner Etch Residue On Advanced FinFET Device Performance
By Coventor - 21 Jul, 2021 - Comments: 0

In this paper, we study the effect of poly corner residue during a 5nm FinFET poly etch process using virtual fabrication. A systemic investigation was performed to understand the impact of poly corner residue on hard failure modes and device performance. Our results indicate that larger width and height residues can lead to a hard failure by creating a short between the source/drain epitaxy an... » read more

Blog Review: June 30
By Jesse Allen - 30 Jun, 2021 - Comments: 0

Siemens EDA's Chris Spear considers what classes should represent in SystemVerilog and offers two major categories along with some helpful UVM tips. Cadence's Paul McLellan listens in on keynotes at the recent TSMC Technology Symposium, including TSMC CEO C. C. Wei's introduction some of the fab's new offerings, such as an automotive-focused N5 process. Synopsys' Dennis Kengo Oka notes th... » read more

Blog Review: June 23
By Jesse Allen - 23 Jun, 2021 - Comments: 0

Synopsys' Manuel Mota shows how splitting SoCs into smaller dies for advanced packaging and using die-to-die interfaces to enable high bandwidth, low latency, and low power connectivity can benefit hyperscale data centers. Siemens EDA's Chris Spear explains the relationship between classes and objects in SystemVerilog with a handy visualization and notes the difference between SystemVerilog ... » read more

Fan-Out Packaging Options Grow
By Mark LaPedus - 17 Jun, 2021 - Comments: 0

Chipmakers, OSATs and R&D organizations are developing the next wave of fan-out packages for a range of applications, but sorting out the new options and finding the right solution is proving to be a challenge. Fan-out is a way to assemble one or more dies in an advanced package, enabling chips with better performance and more I/Os for applications like computing, IoT, networking and sma... » read more

Using Virtual Process Libraries To Improve Semiconductor Manufacturing
By Jeonghoon (James) Kim - 17 Jun, 2021 - Comments: 0

People think that semiconductor process simulation libraries should be developed using a perfect theoretical background that is strongly supported by empirical data. This might be true in academic research, where researchers are trying to develop a systematic approach to understanding a process mechanism. However, it is definitely not true in production fabs, where engineers need to quickly a... » read more

Process Model Calibration: The Key To Building Predictive And Accurate 3D Process Models
By Coventor - 16 Jun, 2021 - Comments: 0

The semiconductor industry has always faced challenges caused by device scaling, architecture evolution, and process complexity and integration. These challenges are coupled with a need to provide new technology to the market quickly. In the initial stages of semiconductor technology development, innovative process flow schemes must be tested using silicon test wafers. These wafer tests are len... » read more

Blog Review: Jun 9
By Jesse Allen - 09 Jun, 2021 - Comments: 0

Arm's Partha Maji introduces a collaboration with the University of Cambridge to advance Bayesian statistics and probabilistic machine learning, which could play a vital role in safety-critical AI applications. Siemens' Thomas Dewey looks at a way to improve autonomous driving capabilities by enabling vehicles to train on past hazardous situations to provide and early warning for when they m... » read more

Principles, Applications, And The Future Of Piezoelectric MEMS
By Joan Asselot - 26 May, 2021 - Comments: 0

Piezoelectricity is a property of certain materials to become electrically polarized under strain and stress. This phenomenon has been studied extensively since it was first discovered in the mid-18th century. Piezoelectric materials can generate an electric charge in response to an applied mechanical stress and can also generate mechanical stress upon an applied electrical charge. These mater... » read more

The Increasingly Uneven Race To 3nm/2nm
By Mark LaPedus and Ed Sperling - 24 May, 2021 - Comments: 2

Several chipmakers and fabless design houses are racing against each other to develop processes and chips at the next logic nodes in 3nm and 2nm, but putting these technologies into mass production is proving both expensive and difficult. It's also beginning to raise questions about just how quickly those new nodes will be needed and why. Migrating to the next nodes does boost performance an... » read more

What’s Next In Fab Tool Technologies?
By Mark LaPedus - 12 May, 2021 - Comments: 0

Experts at the Table: Semiconductor Engineering sat down to discuss extreme ultraviolet (EUV) lithography and other next-generation fab technologies with Jerry Chen, head of global business development for manufacturing & industrials at Nvidia; David Fried, vice president of computational products at Lam Research; Mark Shirey, vice president of marketing and applications at KLA; and Aki Fuj... » read more

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