tag: GlobalFoundries

Tech Talk: MCU Memory Options
By Ed Sperling - 17 May, 2018 - Comments: 0

David Eggleston, vice president of embedded memory at GlobalFoundries, talks about the pros and cons of embedded non-volatile memory versus system in package. https://youtu.be/6KoQTFbFVCo » read more

More Lithography/Mask Challenges (Part 3)
By Mark LaPedus - 16 May, 2018 - Comments: 1

Semiconductor Engineering sat down to discuss lithography and photomask technologies with Gregory McIntyre, director of the Advanced Patterning Department at [getentity id="22217" e_name="Imec"]; Harry Levinson, senior fellow and senior director of technology research at [getentity id="22819" comment="GlobalFoundries"]; Regina Freed, managing director of patterning technology at [getentity id="... » read more

The Week In Review: Manufacturing
By Mark LaPedus - 11 May, 2018 - Comments: 0

Test and packaging In a major surprise, Cohu has entered into a definitive agreement to acquire Xcerra for approximately $796 million. With the deal, Cohu will enter the ATE market. Last year, a group from China entered into a definitive agreement under which it would acquire Xcerra. But the U.S. blocked Xcerra’s sale to the Chinese group. Ironically, at one time, Cohu was reportedly lobbyin... » read more

Blog Review: May 9
By Jesse Allen - 09 May, 2018 - Comments: 0

Mentor's Doug Amos explains the differences (and similarities) between verification and validation, why switching between engines needs to be simpler, and why the limits of verification are driving a growth in validation importance. Synopsys' Melissa Kirschner provides a primer on 5G and the five technologies that will need to work in tandem to bring the promised high speeds and low latency.... » read more

Manufacturing Bits: May 8
By Mark LaPedus - 08 May, 2018 - Comments: 0

Electrolyte transistors Delft University of Technology, the Centre National de la Recherche Scientifique (CNRS) and NTT have developed a nanotransistor technology that will make it easier to measure the concentration of different electrolytes in the body. Electrolytes involve nutrients and chemicals in the body. They perform important functions and a disruption of the electrolyte balance is... » read more

The Week In Review: Manufacturing
By Mark LaPedus - 27 Apr, 2018 - Comments: 0

Chipmakers As reported, Intel is struggling at 10nm. Intel already has encountered some difficulties, as the chip giant late last year pushed out the volume ramp of its new 10nm process from the second half of 2017 to the first part of 2018, according to analysts. Intel continues to struggle with 10nm, and has delayed the volume ramp again, according to multiple reports. During its earnings... » read more

Next EUV Issue: Mask 3D Effects
By Mark LaPedus - 25 Apr, 2018 - Comments: 6

As extreme ultraviolet (EUV) lithography moves closer to production, the industry is paying more attention to a problematic phenomenon called mask 3D effects. Mask 3D effects involve the photomask for EUV. In simple terms, a chipmaker designs an IC, which is translated from a file format into a photomask. The mask is a master template for a given IC design. It is placed in a lithography scan... » read more

Auto Industry Driving Faster
By Mark Granger - 23 Apr, 2018 - Comments: 0

Automotive electronics used to be a lumbering, trailing-edge business. Not anymore. Today, powerful semiconductor technologies are driving the development of automotive features that once might have been seen as science fiction, such as advanced driver-assistance systems (ADAS) which are paving the way to self-driving cars. Overall, the market for semiconductors in automotive applications is... » read more

Design Rule Complexity Rising
By Ed Sperling - 19 Apr, 2018 - Comments: 0

Variation, edge placement error, and a variety of other issues at new process geometries are forcing chipmakers and EDA vendors to confront a growing volume of increasingly complex, and sometimes interconnected design rules to ensure chips are manufacturable. The number of rules has increased to the point where it's impossible to manually keep track of all of them, and that has led to new pr... » read more

Searching For EUV Defects
By Mark LaPedus - 19 Apr, 2018 - Comments: 1

Chipmakers hope to insert extreme ultraviolet (EUV) lithography at 7nm and/or 5nm, but several challenges need to be solved before this oft-delayed technology can be used in production. One lingering issue that is becoming more worrisome is how to find defects caused by [gettech id="31045" comment="EUV"] processes. These processes can cause random variations, also known as stochastic effects... » read more

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