Using DSA With EUV

Why directed self-assembly still has an important role to play at the most advanced nodes.


James Lamb, deputy CTO for advanced semiconductor manufacturing and corporate technical fellow at Brewer Science, looks at how directed self-assembly can be used to supplement EUV at advanced nodes.



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Frederick Chen says:

1x nm DSA still needs 3x nm template CD, which ArF can already provide without stochastic concerns. In fact, DSA is natural multipatterning, can start with much larger sizes.

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