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Using DSA With EUV

Why directed self-assembly still has an important role to play at the most advanced nodes.

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James Lamb, deputy CTO for advanced semiconductor manufacturing and corporate technical fellow at Brewer Science, looks at how directed self-assembly can be used to supplement EUV at advanced nodes.

 

 

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1 comments

Frederick Chen says:

1x nm DSA still needs 3x nm template CD, which ArF can already provide without stochastic concerns. In fact, DSA is natural multipatterning, can start with much larger sizes.

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