Are Larger Reticle Sizes On The Horizon?


Making high-NA EUV lithography work will take a manufacturing-worthy approach to stitching together circuits or a wholesale change to larger masks. Circuit stitching between the exposure fields is challenging the design, yield and manufacturability of the high-NA (0.55) EUV transition. The alternative is a radical change from 6x6-inch to 6x11-inch masks that would eliminate stitching, but it... » read more

2024 Corporate Responsibility Report


Amkor recognizes the need for transparent reporting, and we have been publishing annual reports to facilitate the disclosure of comparable, consistent, and reliable information about our initiatives and progress for our stakeholders. Last year, we verified our targets to achieve net-zero greenhouse gas emissions by 2050, including near-term targets, with the Science Based Targets initiative ... » read more

Thermoelectricity in Topological Flat-Band Compounds (TU Wien, et al.)


A new technical paper titled "Topological Flat-Band-Driven Metallic Thermoelectricity" was published by researchers at TU Wien, Los Alamos National Lab, Flatiron Institute and others. Abstract "Materials where flattened electronic dispersions arise from destructive phase interference, rather than localized orbitals, have emerged as promising platforms for studying emergent quantum phenome... » read more

All-In-One Analog AI Accelerator With CMO/HfOx ReRAM Integrated Into The BEOL (IBM Research-Europe)


A new technical paper titled "All-in-One Analog AI Hardware: On-Chip Training and Inference with Conductive-Metal-Oxide/HfOx ReRAM Devices" was published by researchers at IBM Research-Europe. Abstract "Analog in-memory computing is an emerging paradigm designed to efficiently accelerate deep neural network workloads. Recent advancements have focused on either inference or training accelera... » read more

Review Paper: Wafer-Scale Accelerators Versus GPUs (UC Riverside)


A new technical paper titled "Performance, efficiency, and cost analysis of wafer-scale AI accelerators vs. single-chip GPUs" was published by researchers at UC Riverside. "This review compares wafer-scale AI accelerators and single-chip GPUs, examining performance, energy efficiency, and cost in high-performance AI applications. It highlights enabling technologies like TSMC’s chip-on-wafe... » read more

Reaction Mechanisms in a Chemically Amplified EUV Photoresist (imec, KU Leuven)


A new technical paper titled "Unraveling the Reaction Mechanisms in a Chemically Amplified EUV Photoresist from a Combined Theoretical and Experimental Approach" was published by researchers at imec and KU Leuven. "Our combined experimental and theoretical approach shows that EUV photoemission can simultaneously resolve chemical dynamics and the production of primary and secondary electrons,... » read more

Mixed-Criticality SW Architectures for Centralized HPC Platforms in Software-Defined Vehicles (Daimler, TU Munich)


A new technical paper titled "Towards Mixed-Criticality Software Architectures for Centralized HPC Platforms in Software-Defined Vehicles: A Systematic Literature Review" was published by researchers at Daimler Truck AG and Technical University of Munich. Abstract "Centralized electrical/electronic architectures and High-Performance Computers (HPCs) are redefining automotive software develo... » read more

EUV Lithography: The Resolution Capability And Stochastic Behavior From Statistical Viewpoints


A new technical paper titled "Statistics of EUV exposed nanopatterns: Photons to molecular dissolutions" was published by Hiroshi Fukuda, Hitachi High-Tech Corporation. Abstract "For higher computing power of semiconductor integrated circuits, pattern feature sizes below 10 nm are anticipated by introducing extreme ultraviolet (EUV) lithography with high numerical aperture (NA) optics. Ho... » read more

Can You Build A Known-Good Multi-Die System?


Semiconductor Engineering sat down to discuss the challenges of designing and testing multi-die systems, including how to ensure they will work as expected, with Bill Mullen, Ansys fellow; John Ferguson, senior director of product management at Siemens EDA; Chris Mueth, senior director of new markets and strategic initiatives at Keysight; Albert Zeng, senior engineering group director at Cadenc... » read more

Blog Review: June 18


Synopsys’ John Koeter and other industry experts discuss whether high-bandwidth memory should follow established standards for broad compatibility and scalability or be customized to address specific use case requirements and time-to-market targets. In a podcast, Siemens’ Conor Peick, Dale Tutt, and Mike Ellow chat about how progress in 3D-IC development, thermal management, and the indu... » read more

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