The Other Side Of AI System Reliability


Adding intelligence into pervasive electronics will have consequences, but not necessarily what most people expect. Nearly everything electronic these days has some sort of "smart" functionality built in or added on. This can be as simple as a smoke alarm that alerts you when the batteries are running low, a home assistant that learns your schedule and dials the thermostat up or down, or a r... » read more

Preventing Chips From Burning Up During Test


It’s become increasingly difficult to manage the heat generated during IC test. Absent the proper mitigations, it’s easy to generate so much heat that probe cards and chips literally can burn up. As a result, implementing temperature-management techniques is becoming a critical part of IC testing. “We talk about systems, saying the system is good,” said Arun Krishnamoorthy, senior... » read more

Cloud Vs. On-Premise Analytics


The immense and growing volume of data generated in chip manufacturing is forcing chipmakers to rethink where to process and store that data. For fabs and OSATs, this decision is not one to be taken lightly. The proprietary nature of yield, performance, and other data, and corporate policies to retain tight control of that data, have so far limited outsourcing to the cloud. But as the amount... » read more

Development Of Digital Controlled Technology For High Voltage DC Testing


In recent years, the demand for low power devices has increased due to issues related to global environmental protection. As a result, the demand for high-voltage power devices has also increased. To test such devices, test equipment that can handle high-voltage devices (hereinafter referred to as “test equipment”) is required. In addition, test time must be shortened to reduce manufacturin... » read more

Controlling TC SAW Filter Frequency with Picosecond Ultrasonics


Presented during the poster session at ASMC 2019 PULSE™ technology is a first principles based acoustic metrology technique that is capable of measuring various parameters of interest in semiconductor manufacturing such as multi-layered metal thickness, sound velocity of dielectric films and reflectivity. In this paper, we demonstrate the applications of PULSE technology in the TC-SAW... » read more

Fast Cycle Approximate Simulation Using ARC nSIM NCAM


One of the key factors of successful software (e.g. firmware/application) development is the ability to quickly run and profile software in the absence of target hardware. The earlier in the design process that this is possible, the better, i.e. during the pre-silicon phase. Typically, the pre-silicon phase is dominated by three activities, each with different challenges: Exploring the Ha... » read more

Untangling 3D NAND: Tilt, Registration, And Misalignment


The multiple demands of 3D NAND to enable yield and performance increase in difficulty at each generation. First generation devices, at 24-32 layer pairs, pushed process tools to extremes, going quickly from 10:1 to 40:1 aspect ratios for today’s 64-96 pair single tier devices. The aspect ratios increased as fast as the manufacturing challenges. To continue bit density scaling, processing imp... » read more

Making Sure AI/ML Works In Test Systems


Artificial intelligence/machine learning is being utilized increasingly to find patterns and outlier data in chip manufacturing and test, improving the overall yield and reliability of end devices. But there are too many variables and unknowns to reliably predict how a chip will behave in the field using just AI. Today, every AI use case — whether a self-driving car or an industrial sortin... » read more

Finally, Analyzing All Test And Manufacturing Data Automatically


Product quality and yield, operational efficiency, and time-to-market continue to be dominant drivers in the semiconductor industry. Adding to this complexity is a diverse manufacturing and test supply-chain of independent providers all continuously generating enormous amounts of different types of chip-related data in various formats. The knowledge contained within this data is critical to pro... » read more

Manufacturing Bits: March 8


Two-beam EUV lithography At the recent SPIE Advanced Lithography conference, Nikon gave a presentation on a two-beam extreme ultraviolet (EUV) lithography technology. Still in the conceptual phase, Nikon’s so-called EUV Projection Optical Wafer Exposure Ruling Machine, or EUV Power Machine, is designed for the 1nm node or so. The proposed system has a minimum resolution of 10nm for lines ... » read more

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