tag: 7nm

Looming Issues And Tradeoffs For EUV
By Mark LaPedus - 25 Sep, 2017 - Comments: 5

Momentum is building for extreme ultraviolet (EUV) lithography, but there are still some major challenges to solve before this long-overdue technology can be used for mass production. [gettech id="31045" comment="EUV"] lithography—a next-generation technology that patterns tiny features on a chip—was supposed to move into production around 2012. But over the years, EUV has encountered se... » read more

The Materials Gap
By Ed Sperling - 21 Sep, 2017 - Comments: 0

When consolidation thinned the ranks of semiconductor foundries and equipment makers, materials companies figured things were about to get better. They haven't. There are a couple of reasons for this. First, semiconductors are now so complex and difficult to develop that a slew of innovations are required on all sides. Everyone is familiar with transistor structures, interconnects and lithog... » read more

Unsolved Litho Issues At 7nm
By Ed Sperling - 21 Sep, 2017 - Comments: 1

By Ed Sperling & Mark LaPedus EUV lithography is creating a new set of challenges on the photomask side for which there currently are no simple solutions. While lithography is viewed as a single technology, [gettech id="31045" comment="EUV"] actually is a collection of technologies. Not all of those technologies have advanced equally and simultaneously, however. For example, aberrations... » read more

Challenges Mount For Photomasks
By Mark LaPedus - 21 Sep, 2017 - Comments: 3

Semiconductor Engineering sat down to discuss photomask technologies with Naoya Hayashi, research fellow at Dai Nippon Printing (DNP); Banqiu Wu, principal member of the technical staff and chief technology officer of the Mask and TSV Etch Division at [getentity id="22817" e_name="Applied Materials"]; Weston Sousa, general manager of the Reticle Products Division at [getentity id="22876" commen... » read more

Node Warfare?
By Mark LaPedus - 20 Sep, 2017 - Comments: 6

By Mark LaPedus & Ed Sperling GlobalFoundries uncorked a 12nm finFET process, which the company said will provide a 15% increase in density and more than 10% improvement in performance over the foundry's existing 14nm process. This is GlobalFoundries' second 12nm process. It announced a 12nm FD-SOI process called 12FDX last September, although it first mentioned a 12nm process back in J... » read more

Power Modeling and Analysis
By Brian Bailey - 20 Sep, 2017 - Comments: 0

Semiconductor Engineering sat down to discuss power modeling and analysis with [getperson id="11489" p_name="Drew Wingard"], chief technology officer at [getentity id="22605" e_name="Sonics"]; [getperson id="11763" comment="Tobias Bjerregaard"], chief executive officer for [getentity id="22908" e_name="Teklatech"]; Vic Kulkarni, vice president and chief strategy officer at [getentity id="22021"... » read more

Noise Issues At 10nm And Below
By Magdy Abadir - 14 Sep, 2017 - Comments: 0

Most of the conversations below 10nm have been about lithography, materials and design constraints. But as companies push to 7nm and beyond, they are faced with a host of new challenges, including how to deal with electromagnetic crosstalk. Electromagnetic crosstalk is unwanted interference caused by the electric and magnetic fields of one or more signals (aggressors) affecting another sign... » read more

Frenzy At 10/7nm
By Ann Mutschler - 14 Sep, 2017 - Comments: 1

The number of chipmakers rushing to 10/7nm is rising, despite a slowdown in Moore's Law scaling and the increased difficulty and cost of developing chips at the most advanced nodes. How long this trend continues remains to be seen. It's likely that 7/5nm will require new manufacturing equipment, tools, materials and transistor structures. Beyond that, there is no industry-accepted roadmap, m... » read more

Tech Talk: 7nm Thermal Effects
By Ed Sperling - 14 Sep, 2017 - Comments: 0

ANSYS' Karthik Srinivasan talks about the effect of heat on reliability at advanced process nodes, including self-heating, circuit aging, and how that will affect automotive electronics. https://youtu.be/SS6iAXp0Kn8   Related Tech Talk: 7nm Power Dealing with thermal effects, electromigration and other issues at the most advanced nodes. » read more

IP Biz Changes As Markets Fragment
By Ed Sperling - 22 Aug, 2017 - Comments: 0

Semiconductor Engineering sat down to discuss IP protection, tracking and reuse with Srinath Anantharaman, CEO of [getentity id="22203" e_name="ClioSoft"]; Jeff Galloway, CTO of Silicon Creations; Marc Greenberg, group director of product marketing for [getentity id="22032" e_name="Cadence"]'s IP Group; and John Koeter, vice president of marketing for [getentity id="22035" e_name="Synopsys"]' S... » read more

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