tag: 7nm

Lots Of Little Knobs For Power
By Ann Mutschler - 09 Nov, 2017 - Comments: 3

Dynamic power is becoming a much bigger worry at new nodes as more finFETs are packed on a die and wires shrink to the point where resistance and capacitance become first-order effects. Chipmakers began seeing dynamic power density issues with the first generation of [getkc id="185" kc_name="finFETs"]. While the 3D transistor structures reduced leakage current by providing better gate contro... » read more

The Promises And Challenges Of 7nm
By Frank Ferro - 09 Nov, 2017 - Comments: 0

Despite a waning Moore’s Law and the increasing costs of advanced process nodes, the semiconductor industry is steadily approaching 7 nanometers (nm). The demand for 7nm is driving expected initial tape-outs from fabs by the end of 2017, with initial volumes beginning in 2018 and ramping up by 2019. Silicon fabbed on 7nm nodes will offer a number of benefits for chipmakers, including lower po... » read more

Mixed Messages For Mixed-Signal
By Brian Bailey - 09 Nov, 2017 - Comments: 1

There is no such thing as a purely digital design at advanced nodes today. Even designs that have no [getkc id="37" kc_name="analog"] content are likely relying on [getkc id="38" kc_name="mixed-signal"] components such as SerDes for communications, or voltage regulators for adaptive power control. But the days of purposely attempting to integrate everything including analog and RF onto a single... » read more

Tech Talk: Pseudo SRAM
By Ed Sperling - 26 Oct, 2017 - Comments: 0

eSilicon's Kar Yee Tang explains how to improve performance at 10/7nm without affecting power and area. https://youtu.be/4LI1pBLxxS4 » read more

Searching For EUV Mask Defects
By Mark LaPedus - 19 Oct, 2017 - Comments: 2

Chipmakers hope to insert extreme ultraviolet (EUV) lithography at 7nm and/or 5nm, but several challenges need to be solved before this technology can be used in production. One lingering issue that is becoming more worrisome is how to find [gettech id="31045" comment="EUV"] mask defects. That isn't the only issue, of course. The industry continues to work on the power source and resists. Bu... » read more

Next-Gen Mask Writer Race Begins
By Mark LaPedus - 19 Oct, 2017 - Comments: 5

Competition is heating up in the mask writer equipment business as two vendors—Intel/IMS and NuFlare—vie for position in the new and emerging multi-beam tool segment. Last year, Intel surprised the industry by acquiring IMS Nanofabrication, a multi-beam e-beam mask writer equipment vendor. Also last year, IMS, now part of Intel, began shipping the world’s first multi-beam mask writer f... » read more

Improving Automotive Reliability
By Annapoorna Krishnaswamy - 16 Oct, 2017 - Comments: 0

Semiconductor reliability requirements are rapidly evolving. New applications such as ADAS/self-driving cars and drones are pushing the limits for system reliability. A mobile phone that overheats in your pocket is annoying. In automobiles, it's a much different story. Overheating can impact the operation of backup sensors, which alert the driver that a pedestrian or obstacle is behind them.... » read more

New Power Concerns At 10/7nm
By Ann Mutschler - 16 Oct, 2017 - Comments: 1

As chip sizes and complexity continues to grow exponentially at 7nm and below, managing power is becoming much more difficult. There are a number of factors that come into play at advanced nodes, including more and different types of processors, more chip-package decisions, and more susceptibility to noise of all sorts due to thinner insulation layers and wires. The result is that engineers ... » read more

Crosstalk Analysis At 7nm
By Magdy Abadir - 12 Oct, 2017 - Comments: 0

The increasing demand for electronic systems with increasing bandwidth and decreasing size puts more high-speed circuitry and high bandwidth channels in ever-closer proximity. The continuous increase in internal clock frequencies (e.g. 5 - 10 GHz) and the increase in data rates (e.g. >10Gbps) are fueling the emergence of electromagnetic (EM) crosstalk issues. Parasitic inductance and indu... » read more

Noise Abatement
By Brian Bailey - 12 Oct, 2017 - Comments: 0

[getkc id="285" kc_name="Noise"] is a fact of life. Almost everything we do creates noise as a by-product and quite often what is a signal to one party is noise to another. Noise cannot be eliminated. It must be managed. But is noise becoming a larger issue in chips as the technology nodes get smaller and packaging becomes more complex? For some, the answer is a very strong yes, while for ot... » read more

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