More Problems Ahead


Semiconductor Engineering sat down to discuss future scaling problems with Lars Liebmann, a fellow at IBM; Adam Brand, managing director of transistor technology at Applied Materials; Karim Arabi, vice president of engineering at Qualcomm; and Srinivas Banna, a fellow for advanced technology architecture at GlobalFoundries. SE: Where are the most severe issues these days? Is it on the design... » read more

Blog Review: Aug. 27


In the spirit of making a positive social contribution, and to recognize employees for their contributions to the local community, Applied Materials’ chairman Mike Splinter accepted the ALS Ice Bucket Challenge. Nice job, Mike! With development work underway on the 10nm process node, and questions about getting there with conventional lithography, Cadence’s Richard Goering invites us to ... » read more

More Problems Ahead


Semiconductor Engineering sat down to discuss future scaling problems with Lars Liebmann, a fellow at IBM; Adam Brand, managing director of transistor technology at Applied Materials; Karim Arabi, vice president of engineering at Qualcomm; and Srinivas Banna, a fellow for advanced technology architecture at GlobalFoundries. SE: There seems to be some debate in this group about whether we’r... » read more

Different Approaches Emerge For Stacking Die


The concept of stacking die to shorten wires, improve performance, and reduce the amount of energy required to drive signals has been in research for at least the past dozen years at both IBM and Intel. And depending upon whom you ask, it could be another 2 to 10 years before it becomes a mainstream packaging approach—if it happens at all. At least part of the confusion stems from how you ... » read more

Blog Review: Aug. 20


Ansys’ Bill Vandermark highlights the top five engineering articles of the week. Check out the “Sprouting Baby Monitor.” This may be a sign of what the IoT is really good for. You can also use your cat (or dog or even your kids) to hack your neighbor’s Wi-Fi. Cadence’s Richard Goering says gaps may be narrowing between available tools and what’s needed for 3D-IC design. Now all w... » read more

Manufacturing Bits: Aug. 19


28nm brain chips DARPA-funded researchers have developed a 28nm chip that mimics the brain. The low-power chip is inspired by the neuronal structure of the brain. Designed by researchers at IBM under DARPA’s Systems of Neuromorphic Adaptive Plastic Scalable Electronics (SyNAPSE) program, the chip consists of 5.4 billion transistors. Built on Samsung’s 28nm foundry process, the chip has ... » read more

Ion Implanter Market Heats Up


The ion implanter market has been a stable, if not a sleepy, business. The last big event took place in 2011, when Applied Materials re-entered the ion implanter market by acquiring Varian, the world’s leading supplier of these tools. The acquisition gave Applied Materials a commanding 80% share of the implanter business, with the other players fighting for the crumbs. But after year... » read more

DSA: Hype Or Revolution?


Directed self-assembly (DSA) has become the subject of a great deal of research attention in the lithography world, to the point where there were dedicated sessions at this year’s Advanced Lithography conference in February. So is this just another passing research fad, or is it a technology that will revolutionize semiconductor manufacturing? DSA utilizes a block copolymer that effectivel... » read more

More Problems Ahead


Semiconductor Engineering sat down to discuss future scaling problems with Lars Liebmann, a fellow at IBM; Adam Brand, managing director of transistor technology at Applied Materials; Karim Arabi, vice president of engineering at Qualcomm; and Srinivas Banna, a fellow for advanced technology architecture at GlobalFoundries. SE: We’re starting to hear talk about octuple patterning. We’ve ... » read more

This Is What 450mm Wafers Look Like


The first fully patterned 450mm wafers were on display at SEMICON West 2014 in South Hall and also showcased in the 450mm Technology Development Session. Fully patterned 450mm wafers produced using Molecular Imprints’ Imprio nanoimprint lithography (NIL) tool have been shown before (including at SEMI ISS meeting in January 2013). However, the 450mm wafers on display at SEMICON West were produ... » read more

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