tag: defects

E-Beam Review And CD Measurement Revolutionizes Display Yield Management
By Applied Materials - 20 Mar, 2019 - Comments: 0

Fundamental changes are occurring in the display industry, driven by demands for higher-resolution screens and other capabilities for both mobile and TV applications. To meet these demands, the display technology roadmap in this article calls for innovations in materials, processes and device technology. Critical requirements include smaller design rules and the adoption of a range of materi... » read more

The 3 Main Obstacles To Zero DPPM And How To Overcome Them
By Randy Hierbaum - 12 Mar, 2019 - Comments: 0

As we all well know, there are multiple mission critical applications in today’s “Age of Smart” that are calling for zero DPPM (defective parts per million) in semiconductors and electronic systems. In industries such as automotive, medical, aerospace, and more, where lives are at stake, defective parts are not an option. The quality imperative However, with the ever-growing complexi... » read more

Finding Defects In Chips With Machine Learning
By Mark LaPedus - 12 Mar, 2019 - Comments: 7

Chipmakers are using more and different traditional tool types than ever to find killer defects in advanced chips, but they are also turning to complementary solutions like advanced forms of machine learning to help solve the problem. A subset of artificial intelligence (AI), machine learning has been used in computing and other fields for decades. In fact, early forms of machine learning ha... » read more

Using Sensor Data To Improve Yield And Uptime
By Ed Sperling - 21 Feb, 2019 - Comments: 2

Semiconductor equipment vendors are starting to add more sensors into their tools in an effort to improve fab uptime and wafer yield, and to reduce cost of ownership and chip failures. Massive amounts of data gleaned from those tools is expected to provide far more detail than in the past about multiple types and sources of variation, including when and where that variation occurred and how,... » read more

Using CAA And DFM Scoring To Improve Manufacturing Success
By Mentor, a Siemens Business - 26 Sep, 2018 - Comments: 0

Critical area analysis and design for manufacturing scoring both offer designers actionable information they can use to improve their designs to prevent low-yield issues in the foundry. At the same time, they provide the foundry with information they can use for process improvement. Learn how fabless designers, foundries, and integrated device manufacturers can all benefit from addressing manuf... » read more

Chipping Away At Functional Safety Flaws In Automotive Electronics
By Ansys - 17 Sep, 2018 - Comments: 0

Today’s automobiles are packed with electronics. From autonomous driving support and infotainment systems to mission-critical functions like braking, a car’s performance depends on the reliability of these electronics systems. While the semiconductors that lie at the heart of these systems have been not been a focus in the past, today their reliability is coming under closer scrutiny by bot... » read more

E-beam Inspection Makes Inroads
By Mark LaPedus - 18 Jan, 2018 - Comments: 4

E-beam inspection is gaining traction in critical areas in fab production as it is becoming more difficult to find tiny defects with traditional methods at advanced nodes. Applied Materials, ASML/HMI and others are developing new e-beam inspection tools and/or techniques to solve some of the more difficult defect issues in the fab. [gettech id="31057" t_name="E-beam"] inspection is one of tw... » read more

Measuring ISO 26262 Metrics Of Analog Circuitry In ICs
By Mentor, a Siemens Business - 04 Jan, 2018 - Comments: 0

The goals for automotive electronics are zero defective parts per million (0 DPPM), and safe operation during the expected lifetime of the vehicle. The ISO 26262 standard provides procedures and metrics required before delivery to ensure systems can be expected to operate without unreasonable risk. ISO 26262 specifies circuit metrics and minimum values that are design requirements. Since the... » read more

Process Window Discovery And Control
By Andrew Cross - 18 Dec, 2017 - Comments: 0

With the continued need for shrinking pattern dimensions, semiconductor manufacturers continue to implement more complex patterning techniques, such as advanced multi-patterning, for the 10nm design node and beyond. They also are investing significant development effort in readying EUV lithography for production at the 7/5nm design nodes. Additionally, semiconductor manufacturers’ use of desi... » read more

Nontraditional Post Develop Inspection And Review Strategy For Via Defects
By KLA - 18 Dec, 2017 - Comments: 0

A viable in-line monitor for missing vias in the back end of line (BEOL) has traditionally been challenging due to the nature of the defects. Today’s available solutions do not meet the requirements of a true in-line and at-level monitor strategy. These solutions either indirectly monitor the defect further down the line, put production at risk of damage or contamination due to exceeding stri... » read more

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