tag: EUV

Extreme sources, block copolymers, and resist polishing at SPIE Advanced Lithography.
By Michael Watts - 04 Mar, 2013 - Comments: 0

by Michael P.C. Watts Lots to talk about from SPIE Advance Lithography Conference this year; EUV power, multi-beam systems, double patterning, and imprint. I thought I would pick up some highlights here, and then come back and talk about them in detail over the next few weeks. One of the extreme sources was the paper from Cymer/ASML on EUV sources . Their paper showed performance, at prod... » read more

Bit Mapping
By Ed Sperling - 22 Feb, 2013 - Comments: 0

The rule of thumb for semiconductor manufacturing is that big breakthroughs tend to last a decade, or about five process nodes. While the transistor already has spanned more than five decades and the IC more than four decades, the technology used to create them typically only lasts about one. 193nm lithography has been around more than a decade. Bets were being made publicly back at 45nm—o... » read more

Getting Ready For High-Mobility FinFETs
By Mark LaPedus - 21 Feb, 2013 - Comments: 0

By Mark LaPedus The IC industry entered the finFET era in 2011, when Intel leapfrogged the competition and rolled out the newfangled transistor technology at the 22nm node. Intel hopes to ramp up its second-generation finFET devices at 14nm by year’s end, with plans to debut its 11nm technology by 2015. Hoping to close the gap with Intel, silicon foundries are accelerating their efforts t... » read more

Optical Lithography, Take Two
By Mark LaPedus - 21 Feb, 2013 - Comments: 0

By Mark LaPedus It’s the worst-kept secret in the industry. Extreme ultraviolet (EUV) lithography has missed the initial stages of the 10nm logic and 1xnm NAND flash nodes. Chipmakers hope to insert EUV by the latter stages of 10nm or by 7nm, but vendors are not counting on EUV in the near term and are preparing their back-up plans. Barring a breakthrough with EUV or other technology, IC ... » read more

Accelerating Moore’s Law
By Ed Sperling - 21 Feb, 2013 - Comments: 0

By Ed Sperling Ever since the inception of Moore’s Law, process nodes have moved forward at a rate of once every 18 to 24 months. Companies have been talking about slowing down the rate of progression as things get harder, but at least for the next couple of process nodes something very strange will occur—Moore’s Law will accelerate. The root cause is growing competition for a shrinki... » read more

Taiwan: Aggressive Investments In Equipment For 2013-2014
By Christian Dieseldorff - 21 Feb, 2013 - Comments: 0

By Christian Gregor Dieseldorff Semiconductor equipment spending in 2012 declined significantly in the second half of the year as sluggish conditions in the global economy dampened some investments in the industry. Counter to this trend was spending in the Taiwan, which could come in at the $9.3 billion to $9.5 billion range. This represents $800 million more in equipment for Taiwan compared t... » read more

Making The Right Choices
By Ed Sperling - 21 Feb, 2013 - Comments: 0

FD-SOI at 28nm, or finFETs at 20/14nm? To companies looking at the cost equation, the total market opportunity for SoCs and the NRE required to get there, this is still a manageable formula. It requires lots of number crunching and some unknowns, but by the time you get done with the math it still falls within an acceptable margin of error and the choices are relatively simple. For foundries... » read more

New Issues In Signoff
By Ed Sperling - 14 Feb, 2013 - Comments: 0

By Ed Sperling Signoff has always been a challenge at every stage of an SoC design flow. No matter how good a design looks, or how well a prototype works, there are still problems that can crop up at any stage of the design flow all the way into manufacturing that can leave engineering teams shaking their heads. Even at mainstream process nodes, respins are common. At advanced nodes—part... » read more

Uncommon Goals
By Atrenta - 14 Feb, 2013 - Comments: 0

I had the opportunity to attend the Common Platform event recently. This is a technology and business showcase sponsored by Global Foundries, IBM and Samsung with major support from ARM, Cadence, Synopsys and Mentor. Wow, that’s some serious sponsorship. The event was well run and provided a good balance of technology details and business outlook. The wine at the evening reception was decent ... » read more

Tech Talk: Getting To The Next Node
By Ed Sperling - 14 Feb, 2013 - Comments: 0

IBM's Gary Patton talks with Low-Power/High-Performance Engineering about finFETs, EUV, and the challenges of staying on the Moore's Law road map. [youtube vid=jtz9XSXyBp0] » read more

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