Waiting For Next-Generation Lithography

By Mark LaPedus - 23 Jan, 2014 - Comments: 2

Nearly 30 years ago, optical lithography was supposed to hit the wall at the magical 1 micron barrier, prompting the need for a new patterning technology such as direct-write electron beam and X-ray lithography. At that time, however, the industry was able to push optical lithography for volume chip production at the 1-micron node and beyond. This, in turn, effectively killed direct-write e-... » read more

Counting Pennies

By Ed Sperling - 21 Nov, 2013 - Comments: 0

Even Intel may not have enough cash on hand to pay for a new state-of-the-art fab at 7nm. With fully equipped fabs expected to rise into the plus-$10 billion range over the next few process nodes, and each new process shrink jam-packed with a multitude of new problems, the momentum for continuing to shrink features appears to be slowing down. Technically, it’s possible to shrink transistor... » read more

You Ain’t Seen Nothing Yet

By David Abercrombie - 19 Sep, 2013 - Comments: 1

I’ve been talking about double patterning for a long time now in this series of blogs. I thought it might be good to start looking ahead at what is next for multi-patterning (Don’t Panic!). As you may have been hearing or reading, it doesn’t look like EUV lithography is going to be ready for 10nm, and may not even make it for 7nm. This means that alternative methods of extending the exist... » read more

Layers Of Business And Tech Issues

By Ed Sperling - 15 Aug, 2013 - Comments: 0

Slice an onion in half and one onion pretty much looks like any other onion. Peel it back, layer by layer, and put it under a powerful microscope, and each layer suddenly looks very different. The same is true for semiconductors. To the outside world, a chip is a chip and an interconnect is an interconnect. Each one has different specs, but even the parts that make up those chips look remar... » read more

The Shape Of Things To Come

By Ed Sperling - 13 Jun, 2013 - Comments: 0

By Ed Sperling The standard method of designing chips—by shrinking features and turning up the clock frequency—is running out of steam for many companies. It’s too difficult, too expensive, and without a commercially viable new lithography source it may become even more unrealistic for most applications. That certainly doesn’t mean Moore’s Law is ending, but it could become more o... » read more

Supply Chain Catch-Up

By Ed Sperling - 18 Apr, 2013 - Comments: 0

There always will be a few big companies marching to the latest process node available to them. The problem these days isn’t their commitment to pushing forward. It’s the baggage train following them. It’s getting longer, more diverse, and in some cases, it’s falling out of sync. The foundries are out in front with 14nm finFETs, and they’re already working on 10nm transistors—pos... » read more

Throw In The Kitchen Sink

By Ed Sperling - 05 Apr, 2013 - Comments: 0

By Ed Sperling The number of options available for reducing power and improving performance are increasing for the first time in a decade. This is good news for chipmakers. It’s far less clear who stands to benefit on the tools, IP, capital equipment and manufacturing side. Choice is always a good thing in design. It allows teams to trade off one IP block for another, based upon the needs... » read more

Optical Lithography, Take Two

By Mark LaPedus - 21 Feb, 2013 - Comments: 0

By Mark LaPedus It’s the worst-kept secret in the industry. Extreme ultraviolet (EUV) lithography has missed the initial stages of the 10nm logic and 1xnm NAND flash nodes. Chipmakers hope to insert EUV by the latter stages of 10nm or by 7nm, but vendors are not counting on EUV in the near term and are preparing their back-up plans. Barring a breakthrough with EUV or other technology, IC ... » read more

Experts At The Table: Issues In Lithography

By Ed Sperling - 05 Nov, 2012 - Comments: 0

By Mark LaPedus Semiconductor Manufacturing & Design sat down to discuss future lithography challenges with Juan Rey, senior director of engineering at Mentor Graphics; Aki Fujimura, chairman and chief executive at D2S; and Tatsuo Enami, general manager for the sales division at Gigaphoton. What follows are excerpts of that conversation. SMD: What is the general state of the next-genera... » read more

Experts At The Table: Multipatterning

By Ed Sperling - 31 Jul, 2012 - Comments: 0

By Ed Sperling Semiconductor Manufacturing & Design sat down with Michael White, physical verification product line manager at Mentor Graphics; Luigi Capodieci, R&D fellow at GlobalFoundries; Lars Liebmann, IBM distinguished engineer; Rob Aitken, ARM fellow; Jean-Pierre Geronimi, CAD director at STMicroelectronics; and Kuang-Kuo Lin, director of foundry design enablement at Samsung El... » read more

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tag: multi patterning