Which Foundry Is In The Lead? It Depends.


The multi-billion-dollar race for foundry leadership is becoming more convoluted and complex, making it difficult to determine which company is in the lead at any time because there are so many factors that need to be weighed. This largely is a reflection of changes in the customer base at the leading edge and the push toward domain-specific designs. In the past, companies like Apple, Google... » read more

Why Changes In Computing Are Driving Changes In Photomasks


Aki Fujimura, CEO of D2S, talks with Semiconductor Engineering about massive improvements in computation based upon increased density on chips, and why printing Manhattan shapes on a photomask are no longer sufficient to print high-performance devices with predictable reliability every time. He explains why a discontinuity in EDA physical design has opened the door for printing curvilinear shap... » read more

Visual Fault Inspection Using A Hybrid System Of Stacked DNNs


A technical paper titled "Improving automated visual fault inspection for semiconductor manufacturing using a hybrid multistage system of deep neural networks" was published by researchers at Chemnitz University of Technology (Germany). According to the paper, "this contribution introduces a novel hybrid multistage system of stacked deep neural networks (SH-DNN) which allows the localization... » read more

CHIPS Act: U.S. Releases New Implementation Strategy


The U.S. Department of Commerce today published "A Strategy For The CHIPS For America Fund," outlining its implementation approach to distributing $50 billion from the CHIPS Act of 2022. Find the full strategy paper here, and the executive summary here. Program Goals The program's four primary goals are: Establish and expand domestic production of leading edge semiconductors in ... » read more

Week In Review: Manufacturing, Test


The U.S. Commerce Department issued export controls on key technologies, including gallium oxide (Ga2O3) and diamond substrates, which are used at high voltages and temperatures, as well as EDA tools specifically developed for GAA FETs. It's not clear how this will impact EDA companies, because many of the tools that will be used for designing for GAA FETs already are in use today for finFETs. ... » read more

Equipment Suppliers Brace For GaN Market Explosion


A huge GaN market is opening up, driven by consumer devices and the need for greater energy efficiency across many applications. Suppliers are ready, but to fully compete with SiC in high-voltage automotive applications will require further technological developments in power GaN (gallium nitride). Still, the 2020s mark a very high-growth phase for GaN markets. Revenues in the power GaN mark... » read more

The Human Hand: Curating Good Data And Creating An Effective Deep-Learning R2R Strategy For High-Volume Manufacturing


Currently, the semiconductor manufacturing industry uses artificial intelligence and machine learning to take data and autonomously learn from that data. With the additional data, AI and ML can be used to quickly discover patterns and determine correlations in various applications, most notably those applications involving metrology and inspection, whether in the front-end of the manufacturing ... » read more

A Sputnik Moment For Chips


Chip shortages are the new Sputnik moment, and they have created a sense of national and regional panic not seen since the days of the Cold War. For both the United States and Europe, those shortages have sparked some of the largest technology investments by government in the past half-century that are not strictly for the military — and by far the biggest involving semiconductors. Whi... » read more

E-beam’s Role Grows For Detecting IC Defects


The perpetual march toward smaller features, coupled with growing demand for better reliability over longer chip lifetimes, has elevated inspection from a relatively obscure but necessary technology into one of the most critical tools in fab and packaging houses. For years, inspection had been framed as a battle between e-beam and optical microscopy. Increasingly, though, other types of insp... » read more

For The Love Of Theatre And Mask-Making


Naoya Hayashi has been a friend and important contributor to the eBeam Initiative from our start over 13 years ago. We’re just one of the many interests he has embraced and championed over his 45 year career at DNP. Now it’s our turn to embrace him and thank him for the wonderful memories as he pursues his next chapter after retiring as the first research fellow from DNP this June. Aki Fuji... » read more

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