Fast, Accurate, Automated Via Insertion During Design Implementation Requires Foundry Rule Compliance


As the scaling of silicon technology proceeds, via resistance is becoming a dominant factor in integrated circuit (IC) yield, performance, and reliability. At advanced nodes, interconnects and via dimensions decrease, while the number of metallization layers increases. To moderate the impact of via resistance on yield and reliability and reduce electromigration (EM) and voltage drop (IR) effect... » read more