Can We Measure Next-Gen FinFETs?


After ramping up their respective 16nm/14nm finFET processes, chipmakers are moving towards 10nm and/or 7nm, with 5nm in R&D. But as they move down the process roadmap, they will face a new set of fab challenges. In addition to lithography and interconnects, there is metrology. Metrology, the science of measurements, is used to characterize tiny films and structures. It helps to boost yi... » read more

Getting Over Overlay


Chipmakers continue to migrate to the next node, but there are signs that traditional IC scaling is slowing down. So what’s causing the slowdown? Or for that matter, what could ultimately undo [getkc id="74" comment="Moore's Law"]? It could be a combination of factors. To be sure, IC design costs and complexity are soaring at each node. Scaling challenges are also playing a role. And ov... » read more