Chasing After Carbon Nanotube FETs


Carbon nanotube transistors are finally making progress for potential use in advanced logic chips after nearly a quarter century in R&D. The question now is whether they will move out of the lab and into the fab. Several government agencies, companies, foundries, and universities over the years have been developing, and are now making advancements with carbon nanotube field-effect transi... » read more

The Future Of Transistors And IC Architectures


Semiconductor Engineering sat down to discuss chip scaling, transistors, new architectures, and packaging with Jerry Chen, head of global business development for manufacturing & industrials at Nvidia; David Fried, vice president of computational products at Lam Research; Mark Shirey, vice president of marketing and applications at KLA; and Aki Fujimura, CEO of D2S. What follows are excerpt... » read more

Reshoring Vital To The Future Of Chipmaking


Repatriating offshore manufacturing efforts to the United States – i.e., “reshoring” – is not a new concept. The Reshoring Initiative was founded in 2010, and the Reshoring Institute, founded in 2014, conducts annual surveys of global manufacturers regarding their reshoring plans. The institute’s 2019 survey found that, while a growing number of businesses were rethinking their global... » read more

IC Materials For Extreme Conditions


The number of materials being researched for chips used in extreme environments, such as landing on the planet Venus, is growing. While GaN has captured much of the attention for power conversion circuits, it's just one of several applications for semiconductors in extreme environments. The high voltage, high temperature, and caustic atmospheres found in many industrial and aerospace environ... » read more

ALD Coatings For Critical Chamber Components


With each transition to a new technology node, fab requirements for metal and particle contamination become more stringent, posing challenges for existing coating methods such as anodization or plasma spray that may not provide complete protection against contamination especially on critical chamber components with complex geometry. SEMI spoke with Beneq business executive Sami Sneck about... » read more

SVT: Six Stacked Vertical Transistors


This paper presents a new design architecture for advanced logic SRAM cells using six vertical transistors (with carrier transport along the Z direction), stacked one on top of each other. Virtual fabrication technology was used to identify different process integration schemes to enable the fabrication of this architecture with a competitive XY footprint at an advanced logic node: a unit cell ... » read more

Defect Mitigation And Characterization In Silicon Hardmask Materials


From SPIE Digital Library: In this study, metal contaminants, liquid particle count and on-wafer defects of Si- HMs and filtration removal rates are monitored to determine the effect of filter type, pore size, media morphology, and cleanliness on filtration performance. 5-nm PTFE NTD2 filter having proprietary surface treatment used in this study shows lowest defect count. Authors: Vineet... » read more

Chip Board Interaction Analysis Of 22nm FD-SOI Technology In WLP


Recently, Wafer Level Packaging (WLP) has been in high demand, especially in mobile device applications as a path to enable miniaturization while maintaining good electrical performance. The relatively inexpensive package cost and simplified supply chain are encouraging other industries to adapt WLP capabilities for radio frequency (RF), communications/sensing (mmWave) and automotive applicatio... » read more

Deep Learning (DL) Applications In Photomask To Wafer Semiconductor Manufacturing


The Survey: 2021 Deep Learning Applications List by eBeam Initiative members is a list of current deep learning efforts that are being used in photomask to wafer semiconductor manufacturing. Examples come from ASML, D2S, Fraunhofer IPMS, Hitachi High-Tech Corporation, imec, Siemens Industries Software, Inc., Siemens EDA, STMicroelectronics, and TASMIT. Published by the eBeam Initiative Membe... » read more

Manufacturing Bits: March 16


Tripping up neural networks For years, Russia has been an active area in R&D. In one example, Russia's Skolkovo Institute of Science and Technology (Skoltech) has demonstrated how certain patterns can cause neural networks to make mistakes in recognizing images. Leveraging the theory behind this research, Skoltech can design defenses for pattern recognition systems that are vulnerable t... » read more

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