tag: 10nm

Design Virtualization And Its Impact On SoC Design
By eSilicon - 27 May, 2015 - Comments: 0

At advanced technology nodes (40nm and below), the number of options that a system-on-chip (SoC) designer faces is exploding. Choosing the correct combination of these options can have a dramatic impact on the quality, performance, cost and schedule of the final SoC. Using conventional design methodologies, it is very difficult to know if the correct options have been chosen. There is simply ... » read more

What’s After 10nm?
By Ed Sperling - 21 May, 2015 - Comments: 0

Prior to 28nm the semiconductor road map was astoundingly predictable. Every two years you could be assured that features would shrink until there were no more atoms left. Two big things and lots of little things later, the trajectory looks much more uncertain. On the large things side are the obvious culprits—EUV delays, and RC delay caused by thinner wires. This is tough science. Pro... » read more

10nm Fab Challenges
By Mark LaPedus - 21 May, 2015 - Comments: 1

After a promising start in 2015, the semiconductor equipment industry is currently experiencing a slight lull. The pause is expected to be short-lived, however. Suppliers of [getkc id="208" comment="3D NAND"] devices are expected to add more fab capacity later this year. And about the same time, foundries are expected to order the first wave of high-volume production tools for 10nm. At 10nm... » read more

The Bumpy Road To 10nm FinFETs
By Mark LaPedus - 21 May, 2015 - Comments: 0

Foundry vendors are currently ramping up their 16nm/14nm [getkc id="185" kc_name="finFET"] processes in the market. Vendors are battling each other for business in the arena, although the migration from planar to finFETs is expected to be a slow and expensive process. Still, despite the challenges at 16nm/14nm, vendors are gearing up for the next battle in the foundry business—the 10nm nod... » read more

Waiting For Next-Gen Metrology
By Mark LaPedus - 21 May, 2015 - Comments: 0

Chipmakers continue to march down the various process nodes, but the industry will require new breakthroughs to extend IC scaling at 10nm and beyond. In fact, the industry will require innovations in at least two main areas—patterning and the [getkc id="36" comment="Interconnect"]. There are other areas of concern, but one technology is quickly rising near the top of the list—metrology.... » read more

10nm Fab Watch
By Mark LaPedus - 21 May, 2015 - Comments: 1

When will the 10nm logic node happen? Analysts believe that foundry vendors will move into 10nm finFET volume production around 2017. Still others say the 10nm finFET ramp could take place anywhere from 2018 to 2020. The predictions are all over the map. One way to predict the timing, progress and demand for 10nm is simple: Follow the fabs. In fact, Intel, Samsung, TSMC and GlobalFound... » read more

Next-Gen Metrology: Searching For A Bright X-Ray Source
By SEMI - 21 May, 2015 - Comments: 0

By Debra Vogler Metrology for semiconductor applications is a broad topic regardless of whether one is talking about front-end-of-line (FEOL) or back-end-of-line (BEOL) technologies. Benjamin Bunday, project manager, CD Metrology and senior member of the technical staff at SEMATECH, broke down the topic of next-generation metrology at 10nm and below into four main categories for SEMI: • I... » read more

One-On-One: Thomas Caulfield
By Mark LaPedus - 21 May, 2015 - Comments: 0

Semiconductor Engineering sat down to talk about fabs, process technology and the equipment industry with Thomas Caulfield, senior vice president and general manager of Fab 8 at [getentity id="22819" comment="GlobalFoundries"]. Located in Saratoga County, N.Y., Fab 8 is GlobalFoundries’ most advanced 300mm wafer fab. What follows are excerpts of that discussion. SE: Last year, GlobalFoundr... » read more

Less Moore Means More Intelligence
By Brian Bailey - 23 Apr, 2015 - Comments: 3

It would seem as if the entire industry is flooding the forums with articles about [getkc id="74" comment="Moore's Law"], as it reaches its 50th birthday (April 19th) and that this represents the longest and most important exponential in the history of man. The numbers and that impact are everywhere and I do not intend to repeat them. There are lots of articles talking about when Moore’s law ... » read more

Big Changes At 10nm And Beyond
By Ed Sperling - 16 Apr, 2015 - Comments: 0

The move to 16/14nm finFETs is relatively straightforward. The move to 10nm and 7nm will be quite different. While double patterning with colors at 16/14nm has a rather steep learning curve, reports from chipmakers developing advanced chips is the technology and methodologies are manageable once engineering teams begin working with it. The hardest part is visualizing how different parts will... » read more

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