A New Dawn For IP


The IP industry is changing again. The concept started as build once, use everywhere, but today it is more like architect once, customize everywhere. Few designs can afford sub-optimal IP for their application. The need for customized IP is driven by both leading-edge designs and the trailing markets, although for different reasons. While this customization is causing IP companies to transfo... » read more

Defining And Improving AI Performance


Many companies are developing AI chips, both for training and for inference. Although getting the required functionality is important, many solutions will be judged by their performance characteristics. Performance can be measured in different ways, such as number of inferences per second or per watt. These figures are dependent on a lot of factors, not just the hardware architecture. The optim... » read more

5 Major Shifts In Automotive


Much of the automotive industry has begun repositioning and retrenching over the past few months, pushing back the projected rollout for fully autonomous vehicles and changing direction on power sources and technology used in the next-generation of electric vehicles. Taken together, these shifts mark a significant departure for traditional automakers, which find themselves playing catch-up t... » read more

The Growing Challenges Of 5G Reliability


The test field is getting more complicated as chips become larger, more heterogeneous, and subject to almost constant changes. Nowhere is this more evident than in 5G, where standards are still evolving and use cases are still being defined. Without passing test, no technology advances. But those definitions are subject to change, and they can change again over time. The communications in... » read more

Gaps Emerge In Test And Analytics


Sensor and process drift, increased design complexity, and continued optimization of circuitry throughout its lifetime are driving test and analytics in new directions, requiring a series of base comparisons against which equipment and processes can be measured. In the design world this type of platform is called a digital twin, but in the test world there is no equivalent today. And as more... » read more

Testing In Context Gaining Ground


Testing in context is beginning to gain wider appeal as chip complexity increases, and as ICs are deployed in more safety-critical and mission-critical applications. While design in context has been the norm for SoCs for some time, a similar approach in test has been slow going. Cell-aware testing technology was first described a decade ago, and since then its adoption has been modest. But w... » read more

Betting On Hydrogen-Powered Cars


The automotive industry is taking another look at hydrogen fuel cells, but how they ultimately fare depends on a combination of consumer demand, automaker investment and infrastructure build-out. Hydrogen fuel cell technology has been steadily advancing over the past six decades since the first practical fuel cell system was demonstrated by Cambridge engineering professor Francis Bacon. The ... » read more

A Trillion Security Risks


An explosion in IoT devices has significantly raised the security threat level for hardware and software, and it shows no sign of abating anytime soon. Sometime over the next decade the number of connected devices is expected to hit the 1 trillion mark. Expecting all of them to be secure is impossible, particularly as the attack surface widens and the attack vectors become more sophisticated... » read more

November 2019 Startup Funding


During November, 16 tech startups raised private funding rounds of $100 million or more, together receiving $3.42 billion. Investors were drawn to many of the same technology fields that were popular in 2019 — automotive and mobility tech, artificial intelligence and machine learning, cybersecurity, platforms, semiconductors, and software. Analytics of multiple different types were big in ... » read more

Multi-Patterning EUV Vs. High-NA EUV


Foundries are finally in production with EUV lithography at 7nm, but chip customers must now decide whether to implement their next designs using EUV-based multiple patterning at 5nm/3nm or wait for a new single-patterning EUV system at 3nm and beyond. This scenario revolves around ASML’s current extreme ultraviolet (EUV) lithography tool (NXE:3400C) versus a completely new EUV system with... » read more

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