Four Factors Driving Processor Choices


By Ed Sperling Choosing processors for an SoC, a system-in-package, or even a complete system is becoming much more difficult, and the challenge is growing as demands on performance, power, area and time to market continue to increase. There are many reasons why this is becoming more difficult—and some designs will require more tradeoffs than others, depending upon IP re-use or a particul... » read more

CNSE Readying NFX Fab for G450C, EUV Efforts


By David Lammers Two key areas of the semiconductor industry’s future—the 450mm wafer transition and EUV lithography—are the focus of the new NFX (NanoFab Xtension) building now under construction at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany. [caption id="attachment_6322" align="alignright" width="120" caption="Alain Kaloyeros"][/caption] T... » read more

AL 2012 – Day 4


As expected, the first EUV session of the last day of the conference filled a large room.  It was time to hear the status of EUV tool development, in particular the EUV sources.  ASML started things off with a rosy recounting of the successes of 2011.  After installing their sixth NXE:3100 preproduction tool, ASML bragged of the 5300 EUV wafers processed at customer sites by these six tools ... » read more

Cymer’s EUV Power Source Roadmap Slips


Amid record sales for the fourth quarter, Cymer Inc. disclosed that it has delayed the shipment of its 20 Watt extreme ultraviolet (EUV) power source upgrade unit by nearly a quarter. The company also remains under pressure to deliver a separate 100 Watt power source for EUV by mid-year. The main EUV tool vendor — ASML Holding NV — expects to ship its NXE:3300B, a full-blown, 13.5nm EU... » read more

EUV Focus Shifts To Affordability


By David Lammers Over the past year, key technologists in the semiconductor industry have come around to believing that EUV lithography will be available for critical mask layers in the next three to five years. What is still up for debate is whether EUV will be cost-effective for low-power consumer SoCs. To penetrate that cost-sensitive market, EUV must overcoming hurdles presented by masks, ... » read more

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