tag: finFETs

Memory Design At 16/14nm
By Brian Bailey - 28 May, 2015 - Comments: 0

As we get older the memory may start to fade, but that is not a viable option if we are talking about embedded memory. Chips contain increasing amounts of memory, and for many designs memory consumes more than half of the total chip area. “At 28nm we saw a few people with greater than 400Mbits of memory on chip,” says Prasad Saggurti, product marketing manager for Embedded Memory IP at [... » read more

Get Agile
By Randy Smith - 28 May, 2015 - Comments: 0

History repeats itself, but frequently not in the exactly the same place. The problems faced by system engineering teams today—rising complexity, shorter market windows and more issues involving interactions that affect everything from dynamic power and leakage current to electromigration and finFET design—mirror the kinds of top-down issues that software developers began encountering more ... » read more

Tech Talk: Power Tools
By Ed Sperling - 27 May, 2015 - Comments: 0

At 200 million gates, using standard tools for power will add weeks to the semiconductor design process. Vijay Chobisa, product marketing manager at Mentor Graphics, talks with Semiconductor Engineering about where the problems are and how to solve them. [youtube vid=w7yEdtaIb9A] » read more

What’s After 10nm?
By Ed Sperling - 21 May, 2015 - Comments: 0

Prior to 28nm the semiconductor road map was astoundingly predictable. Every two years you could be assured that features would shrink until there were no more atoms left. Two big things and lots of little things later, the trajectory looks much more uncertain. On the large things side are the obvious culprits—EUV delays, and RC delay caused by thinner wires. This is tough science. Pro... » read more

10nm Fab Challenges
By Mark LaPedus - 21 May, 2015 - Comments: 1

After a promising start in 2015, the semiconductor equipment industry is currently experiencing a slight lull. The pause is expected to be short-lived, however. Suppliers of [getkc id="208" comment="3D NAND"] devices are expected to add more fab capacity later this year. And about the same time, foundries are expected to order the first wave of high-volume production tools for 10nm. At 10nm... » read more

Waiting For Next-Gen Metrology
By Mark LaPedus - 21 May, 2015 - Comments: 0

Chipmakers continue to march down the various process nodes, but the industry will require new breakthroughs to extend IC scaling at 10nm and beyond. In fact, the industry will require innovations in at least two main areas—patterning and the [getkc id="36" comment="Interconnect"]. There are other areas of concern, but one technology is quickly rising near the top of the list—metrology.... » read more

Tech Talk: 14nm
By Ed Sperling - 21 May, 2015 - Comments: 0

Tamer Ragheb, digital design methodology technical lead at GlobalFoundries about what's changed with 14nm finFETs, including coloring with double patterning, new corners, Miller Effects, timing issues and variability. [youtube vid=Yk6jSKCtsjU] » read more

Next-Generation Parasitic Extraction For 16nm And Beyond
By Mentor, a Siemens Business - 21 May, 2015 - Comments: 0

Advanced nodes and innovative process features such as finFET transistors require a leap forward in the performance and accuracy of analysis tools. The new Calibre xACT solution is a high-performance, high-accuracy parasitic extraction tool architected from the top-down for diverse IC design styles at advanced nodes. The Calibre xACT product delivers reference-level accuracy for leading-edge fi... » read more

One-On-One: Thomas Caulfield
By Mark LaPedus - 21 May, 2015 - Comments: 0

Semiconductor Engineering sat down to talk about fabs, process technology and the equipment industry with Thomas Caulfield, senior vice president and general manager of Fab 8 at [getentity id="22819" comment="GlobalFoundries"]. Located in Saratoga County, N.Y., Fab 8 is GlobalFoundries’ most advanced 300mm wafer fab. What follows are excerpts of that discussion. SE: Last year, GlobalFoundr... » read more

Rethinking Power
By Ed Sperling - 14 May, 2015 - Comments: 0

Power typically has been the last factor to be considered in the PPA equation, and it usually was somebody else's problem. Increasingly it's everyone's problem, and EDA companies are beginning to look at power differently than in the past. While the driving forces vary by market and by process node, the need to save energy at every node and in almost all designs is pervasive. In the server m... » read more

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