tag: finFETs

Moore’s Law Reset?
By Ed Sperling - 13 Jul, 2015 - Comments: 0

GlobalFoundries today took the wraps off its 22nm FD-SOI process, promising to extend Moore's Law technologically without altering the economic equation—at least for the next couple of process nodes. Subramani Kengeri, vice president of global design solutions at [getentity id="22819" comment="GlobalFoundries"], said 22nm FD-SOI will provide the same 30% improvement in PPA that has been c... » read more

Moore Memory Problems
By Brian Bailey - 09 Jul, 2015 - Comments: 0

The six-transistor static memory cell (SRAM) has been the mainstay of on-chip memory for several decades and has stood the test of time. Today, many advanced SoCs have 50% of the chip area covered with these memories and so they are critical to continued scaling. “The SRAM being used in modern systems is similar to the SRAM they were using in the 1970s and 1980s,” says Duncan Bremner, ch... » read more

IP Integration Challenges Increase
By Ed Sperling - 08 Jul, 2015 - Comments: 0

Semiconductor Engineering sat down with Chris Rowen, CTO of [getentity id="22032" e_name="Cadence"]'s IP group; Rob Aitken, an [getentity id="22186" comment="ARM"] fellow; Patrick Soheili, vice president of product management and corporate development at [getentity id="22242" e_name="eSilicon"]; Navraj Nandra, senior director of marketing for DesignWare analog and mixed-signal IP at [getentity ... » read more

Executive Insight: Wally Rhines
By Ed Sperling - 01 Jul, 2015 - Comments: 0

Wally Rhines, chairman and CEO of Mentor Graphics, sat down with Semiconductor Engineering to talk about what's changing across a wide swath of the industry, where the new opportunities will be, when security will become a real opportunity for EDA, and why Moore's Law will die but progress will continue forever. SE: Looking back over the past year, what's changed and where are the possible r... » read more

Litho Challenges Break The Design-Process Wall
By Katherine Derbyshire - 22 Jun, 2015 - Comments: 3

The days when chip designers could throw tape “over the wall” to the manufacturing side are long gone. Over the last several technology generations, increasingly restrictive process kits have forced designers to accommodate their circuit structures to the manufacturing process. Lacking a successor to 193nm lithography, the industry has turned to increasingly complex resolution enhancemen... » read more

Foundries Expand Planar Efforts
By Mark LaPedus - 18 Jun, 2015 - Comments: 0

Competition is heating up in the leading-edge foundry business, as vendors begin to ramp up their new 16nm/14nm finFET processes. But that’s not the only action in the foundry arena. They are also expanding their efforts in the leading-edge planar market by rolling out new 28nm and 22nm processes. On one front, TSMC is offering new 28nm variants, based on bulk CMOS technology. And on an... » read more

Getting Over Overlay
By Mark LaPedus - 18 Jun, 2015 - Comments: 0

Chipmakers continue to migrate to the next node, but there are signs that traditional IC scaling is slowing down. So what’s causing the slowdown? Or for that matter, what could ultimately undo [getkc id="74" comment="Moore's Law"]? It could be a combination of factors. To be sure, IC design costs and complexity are soaring at each node. Scaling challenges are also playing a role. And ov... » read more

FinFET And Multi-Patterning Aware Place And Route Implementation
By Mentor, a Siemens Business - 18 Jun, 2015 - Comments: 0

The use of finFETs and multi-patterning has a huge impact on the entire physical implementation flow. This paper outlines the new challenges in placement, routing, optimization, and physical verification and describes how the Olympus-SoC place and route system handles them. To read more, click here. » read more

3 Ways To Reload Moore’s Law
By Michael Watts - 18 Jun, 2015 - Comments: 1

The electronics revolution has been enabled because the cost and power per transistor has decreased 30% per year for the last 30 years — a fact usually associated with Moore's Law. This has been accomplished by simply reducing the transistor size while offsetting increased costs of equipment and mask levels, and by increased productivity from improved yield, throughput and wafer size. This... » read more

Managing Dynamic Power
By Ann Mutschler - 16 Jun, 2015 - Comments: 0

Working with finFETs is a study in contrasts. While leakage is now under control for the first time in several process generations due to the advent of different gate technology, dynamic power density caused by tightly packed transistors and higher clock speeds has become the big issue. “FinFET technology helps with reducing static/leakage power so when your logic is not active, you can sh... » read more

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