Finding The Bottom Of The Memory Trough


In announcing its Q2 fiscal 2019 results, Micron Technology, Inc. provided lower-than-expected revenue guidance of between $46 billion and $50 billion for the current quarter. However, what was particularly noteworthy was the company’s announcement to cut output by 5 percent due to weaker-than-expected market demand and its prediction that its customers’ inventory correction will last until... » read more

Manufacturing Bits: April 16


Water that won’t freeze ETH Zurich and the University of Zurich have developed water that doesn’t freeze at cold temperatures. Using various molecules with water, researchers have been able to cool the substance down to minus 263 degrees Celsius. Even then, there were no ice crystals formed in the substance. This technology could be used to develop new biomolecules and membranes for ... » read more

Finding The Source Of EUV Stochastic Effects


The next phase of EUV development has begun—making EUV more predictable and potentially more mainstream—and it's looking to be every bit as difficult and ambitious as other developments in advanced lithography. In the early days of EUV development, supporters of the technology argued that it was “still based on photons,” as opposed to alternatives like electron beam lithography. Whil... » read more

Week In Review: Manufacturing, Test


Fab tools ASML said it has disagreed with any implication that it has been a victim of “Chinese espionage,” as stated in an article in a Dutch newspaper. The article discusses the results of a public court case in the United States that ASML won last year. In the case, XTAL was found by a jury to have misappropriated ASML’s confidential and proprietary information as well as trade secret... » read more

Manufacturing Bits: April 8


Designing metamaterials Sandia National Laboratories has developed an inverse-design software technology that automates the design of optical metamaterials. Metamaterials are artificial materials containing arrays of metal nanostructures or mega-atoms. Some metamaterials are able to bend light around objects, rendering them invisible. But they only interact with light over a very narrow ran... » read more

Week In Review: Manufacturing, Test


Public policy The rise of the digital economy is creating millions of new jobs, but it’s difficult to fill these positions. So, the Consumer Technology Association (CTA), a U.S.-based trade group, is encouraging hi-tech companies to offer more apprenticeships. This is especially true for software engineering, networking, data analytics, cybersecurity and artificial intelligence. The Semic... » read more

Manufacturing Bits: April 2


Bright particle accelerators The High Energy Accelerator Research Organization (KEK) has reached a major milestone in the world’s most luminous or brightest particle accelerator. KEK has recently made the first physics run in the SuperKEKB, a storage ring that combines an electron-positron collider with a new and advanced detector. Electron-positron collisions have restarted at the SuperK... » read more

Week In Review: Manufacturing, Test


Materials Wesfarmers, an Australian diversified firm, has made an unsolicited bid to acquire Lynas, one of the world’s largest suppliers of rare earths outside of China. Rare earths are chemical elements found in the Earth’s crust. They are used in cars, consumer electronics, computers, communications, clean energy and defense systems. The big market for rare earths is magnets. In semicond... » read more

Manufacturing Bits: March 26


ALD materials database Atomic Limits, a blog site that addresses atomic-level processing technologies, has developed an online database listing all atomic layer deposition (ALD) materials and processes. The database could be useful for ALD processes in semiconductors and other fields. ALD is a deposition technique that deposits materials one layer at a time. In ALD systems, wafers are place... » read more

Improving SAQP Patterning Yield Using Virtual Fabrication And Advanced Process Control


Advanced logic scaling has created some difficult technical challenges, including a requirement for highly dense patterning. Imec recently confronted this challenge, by working toward the use of Metal 2 (M2) line patterning with a 16 nm half-pitch for their 7nm node (equivalent to a 5nm foundry node). Self-Aligned Quadruple Patterning (SAQP) was investigated as an alternative path to Extreme Ul... » read more

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