By Ann Steffora Mutschler
In the evolving discussion of 3D ICs and through silicon via (TSV) technology, a key issue engineering teams are facing today is how to reduce the thermal coefficients between substrates in a stacked die. Simply put, what is the best way to get the heat out of the 2.5 or 3D IC?
The answer, of course, is anything but simple.
“In a 3D system, the heat hierarchy ...
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