category: Top Stories

category: Auto, Security & Edge AI

Is Cloud Computing Suitable for Chip Design?
By Brian Bailey - 27 Sep, 2018 - Comments: 2

Is semiconductor design being left behind in a cloud-dominated world? Finance, CRM, office applications and many other sectors have made the switch to a cloud-based computing environment, but the EDA industry and its users have hardly started the migration. Are EDA needs and concerns that different from everyone else? We are starting to see announcements from EDA companies, but few cheerleaders... » read more

Betting Big On Discontinuity
By Ed Sperling - 27 Sep, 2018 - Comments: 0

Wally Rhines, president and CEO of Mentor, a Siemens Business, sat down with Semiconductor Engineering to talk about the booming chip industry, what's driving it, how long it will last and what changes are ahead in EDA and chip architectures. What follows are excerpts of that conversation. SE: The EDA and semiconductor industries are doing well right now. What's driving that growth? Rhine... » read more

Domain Crossing Nightmares
By Brian Bailey - 27 Sep, 2018 - Comments: 1

Semiconductor Engineering sat down to discuss problems associated with domain crossings with Alex Gnusin, design verification technologist for Aldec; Pete Hardee, director, product management for Cadence; Joe Hupcey, product manager and verification product technologist for Mentor, a Siemens Business; Sven Beyer, product manager design verification for OneSpin; and Godwin Maben, applications en... » read more

EUV Pellicle, Uptime And Resist Issues Continue
By Mark LaPedus - 26 Sep, 2018 - Comments: 0

Extreme ultraviolet (EUV) lithography is moving closer to realization, but several problems involving scanner uptime, photoresists and pellicles need to be resolved before this long-overdue technology is put into full production. Intel, Samsung and TSMC are hoping to insert EUV into production at 7nm and/or 5nm. While the remaining issues don’t necessarily pre-empt using EUV, they do affec... » read more

Machine Learning Shifts More Work to FPGAs, SoCs
By Kevin Fogarty - 24 Sep, 2018 - Comments: 0

A wave of machine-learning-optimized chips is expected to begin shipping in the next few months, but it will take time before data centers decide whether these new accelerators are worth adopting and whether they actually live up to claims of big gains in performance. There are numerous reports that silicon custom-designed for machine learning will deliver 100X the performance of current opt... » read more

Cryogenic Etch Re-Emerges
By Mark LaPedus - 20 Sep, 2018 - Comments: 0

After years in R&D, a technology called cryogenic etch is re-emerging as a possible option for production as the industry faces new challenges in memory and logic. Cryogenic etch removes materials in devices with high aspect ratios at cold temperatures, although it has always been a challenging process. Cryogenic etch is difficult to control and it requires specialized cryogenic gases in... » read more

Variation’s Long, Twisty Tail Worsens At 7/5nm
By Ed Sperling - 20 Sep, 2018 - Comments: 1

Variation is becoming a bigger challenge at each new node, but not just for obvious reasons and not always from the usual sources. Nevertheless, dealing with these issues takes additional time and resources, and it can affect the performance and reliability of those chips throughout their lifetimes. At a high level, variation historically was viewed as a mismatch between what design teams in... » read more

SiC Chip Demand Surges
By Mark LaPedus - 20 Sep, 2018 - Comments: 0

The silicon carbide (SiC) power semiconductor market is experiencing a sudden surge in demand amid growth for electric vehicles and other systems. But the demand also is causing a tight supply of SiC-based devices in the market, prompting some vendors to add fab capacity in the midst of a tricky wafer-size transition. Some SiC device makers are transitioning from 4- to 6-inch wafers in the f... » read more

Auto Chip Design, Test Changes Ahead
By Kevin Fogarty - 19 Sep, 2018 - Comments: 0

The automotive industry’s unceasing demand for performance, coupled with larger and more complex processors, are driving broad changes in how electronics are designed, verified and tested. What's changing is that these systems, which include AI-oriented logic developed at the most advanced process nodes, need to last several times longer than traditional IT and consumer devices, and they n... » read more

Survey: EUV Optimism Grows
By Mark LaPedus - 17 Sep, 2018 - Comments: 2

The confidence level remains high for extreme ultraviolet (EUV) lithography, although the timing of the insertion remains a moving target, according to a new survey released by the eBeam Initiative. At the same time, the outlook for the overall photomask industry is bullish, according to the survey. On the downside, however, there appears to be no progress in terms of improving mask turnaro... » read more

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