Chip Industry’s Technical Paper Roundup: Apr. 4

Demystifying CXL memory; physical design macro placement; 3-gated reconfigurable FETs; ALD for wafer bonding beyond silicon; self-adaptive HW with ReRAMs for neurocomputing; SiC & quantum nanophotonic HW; covert channel and PDN; scalable ALD for 2D semiconductors.

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New technical papers recently added to Semiconductor Engineering’s library:

Technical Paper Research Organizations
Demystifying CXL Memory with Genuine CXL-Ready Systems and Devices University of Illinois Urbana-Champaign (UIUC) and Intel Labs
AutoDMP: Automated DREAMPlace-based Macro Placement NVIDIA
Large-area synthesis of high electrical performance MoS2 by a commercially scalable atomic layer deposition process University of Southampton, LMU Munich, and VTT Technical Research Centre of Finland
Insights into the Temperature Dependent Switching Behaviour of Three-Gated Reconfigurable Field Effect Transistors NaMLAB and TU Dresden
Utilizing photonic band gap in triangular silicon carbide structures for efficient quantum nanophotonic hardware UC Davis
Room-temperature bonding of Al2O3 thin films deposited using atomic layer deposition Kyushu University
A self-adaptive hardware with resistive switching synapses for experience-based neurocomputing Infineon Technologies, Politecnico di Milano and IUNET, Weebit Nano, and CEA Leti
CPU to FPGA Power Covert Channel in FPGA-SoCs TU Munich and Fraunhofer Research Institution AISEC

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