A new technical paper titled "Enhanced Edge Etching Resistance and EUV Lithographic Performance of a Tin-Oxide Photoresist via a Blend Strategy" was published by researchers at National Tsing Hua University.
Abstract
"Enhancing the edge resistance capability of extensively studied metal carboxylate clusters as extreme ultraviolet (EUV) photoresists is a formidable and unsolved task. This wo...
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