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Why EUV Is So Difficult


For years, extreme ultraviolet (EUV) lithography has been a promising technology that was supposed to help enable advanced chip scaling. But after years of R&D, EUV is still not in production despite major backing from the industry, vast resources and billions of dollars in funding. More recently, though, [gettech id="31045" comment="EUV"] lithography appears to be inching closer to pos... » read more

Resist Sensitivity, Source Power, And EUV Throughput


In a recent article, I quoted 15 mJ/cm2 as the target sensitivity for EUV photoresists, and discussed the throughput that could be achieved at various source power levels. However, as a commenter on that article pointed out, reaching the 15 mJ/cm² target while also meeting line roughness requirements is itself a challenging problem. Because of the high energy of EUV photons, a highly sensitive... » read more

Predictive Fab Management


Managing variation requires a different approach in fab management, moving from reactive to predictive methodologies. This is easier said than done, however. Predictive fab management requires a much more detailed understanding of everything happening in the fab, including process variation, equipment variation, mix variation—all of which must be managed with dispatch strategies to produc... » read more