Post-doping plasma for DRAM capacitors
Researchers from Ulsan National Institute of Science and Technology (UNIST), Pohang University of Science and Technology (POSTECH), and Seoul National University of Science and Technology developed a post-doping plasma (PDP) process to improve the performance of DRAM capacitors.
Aluminum-doped titanium dioxide (Al-doped TiO2) is a promising material fo...
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