Blend Strategy To Improve Edge Resistance Capability And Thickness Of EUV-Fabricated Nanopatterns (National Tsing Hua Univ.)


A new technical paper titled "Enhanced Edge Etching Resistance and EUV Lithographic Performance of a Tin-Oxide Photoresist via a Blend Strategy" was published by researchers at National Tsing Hua University. Abstract "Enhancing the edge resistance capability of extensively studied metal carboxylate clusters as extreme ultraviolet (EUV) photoresists is a formidable and unsolved task. This wo... » read more