Radio Frequency Filters For 5G: What They Are And Why They’re Worth The Trouble


By David Haynes, Daniel Shin, and Lidia Vereen­ In the recent blog article "Our wireless world – how Wi-Fi 6 will seamlessly integrate with 5G to keep us connected," David Haynes from our Customer Support Business Group (CSBG) explained how this new generation of wireless technologies will improve our connectivity by using higher frequencies and greater bandwidth than current 4G and Wi-F... » read more

New Materials Open Door To New Devices


Integrating 2D materials into conventional semiconductor manufacturing processes may be one of the more radical changes in the chip industry’s history. While there is pain and suffering associated with the introduction of any new materials in semiconductor manufacturing, transition metal dichalcogenides (TMDs) support a variety of new device concepts, including BEOL transistors and single-... » read more

Insights From Industry Strategy Symposium Europe 2022


The timely return to an in-person Industry Strategy Symposium (ISS) Europe was welcomed by participants from around the globe on May 30th at the Brussels Sheraton. ISS Europe 2022 featured a new program and event format – with industry insights and strategic topics condensed into one day of programming on three critical challenges facing the microelectronics industry: the energy crisis and su... » read more

Enabling The 5G RF Front-End Module Evolution With The DSMBGA Package


The advanced SiP double-sided molded BGA platform has become an industry technology standard in this domain. Applying leading-edge design rules for 3D component placement and double-sided molding, together with conformal and compartmental shielding and in-line RF testing, delivers integration levels in a small form factor with high yield. In addition to formidable SiP capacity and DSMBGA techno... » read more

Suppressing Stochastic Interaction To Improve EUV Lithography


Authors Zhimin Zhu Sr., Joyce Lowes, Shawn Ye, Zhiqiang Fan, and Tim Limmer of Brewer Science, Inc. (United States) used Stochastic Area Thickness (SAT) and Dynamic Stochastic Area Thickness (DSAT) to evaluate the stochastic interactions. High optical foot exposure is proposed instead of conventional low substrate reflectivity to reduce SAT. Adhesion control by acid/quencher loading is proposed... » read more

U.S. Chip Packaging With Mil-Spec Precision


Download this white paper to learn: How you can transform your plastic package dummies, test rejects, and excess inventory into ready-to-assemble components The value of an onshore solution for navigating around ITAR supply constraints The benefits from producing chip prototypes that are mechanically and electrically identical to future molded production parts Why Open-Cavity Plas... » read more

5 Tips To Successfully Work Hybrid


Brewer Science is a global company that has international offices and remote employees since I was first hired in 1993. When the pandemic started in 2020, the company easily adapted to a remote/work-from-home structure. We have a company culture that thrives on change, in part due to the innovating and pioneering mindset the company was founded on. These cultural and business practices, combine... » read more

Week in Review: Manufacturing, Test


Fab capacity STMicroelectronics and GlobalFoundries inked a deal to build a new jointly-operated 300mm fab adjacent to ST’s existing 300mm facility in Crolles, France. This facility is targeted to ramp at full capacity by 2026, with up to 620,000 300mm wafer per year production at full build-out (~42% ST and ~58% GF). The new facility will support several technologies, with a special focus... » read more

Week In Review, Manufacturing, Test


The U.S. is attempting to restrict sales of ASML’s deep ultra-violet (DUV) litho systems to China, according to a report from Bloomberg. The U.S. has been working to limit China's access to advanced technology for some time, and it has already limited sales of extreme ultra-violet (EUV), which is used to develop chips at the most advanced process nodes. DUV, in contrast, is used for older-nod... » read more

For The Love Of Theatre And Mask-Making


Naoya Hayashi has been a friend and important contributor to the eBeam Initiative from our start over 13 years ago. We’re just one of the many interests he has embraced and championed over his 45 year career at DNP. Now it’s our turn to embrace him and thank him for the wonderful memories as he pursues his next chapter after retiring as the first research fellow from DNP this June. Aki Fuji... » read more

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