Designing Chips That Can Explain Themselves


Key Takeaways: On-die telemetry gives architects a path to replace worst-case design margin with measured silicon behavior, improving PPA without compromising resilience. As monitor density and control-loop speed increase, observability must be architected hierarchically across local hardware response, on-die processing, and fleet-level learning. The real payoff is architectural: str... » read more

Observability Is Essential For Modern Silicon


Experts At The Table: In-silicon observability — also known as on-die or on-chip visibility — is becoming increasingly important for managing the performance, reliability, and security of today’s high-performance systems. Semiconductor Engineering sat down to discuss this with Andy Nightingale, vice president of product management and marketing at Arteris; Nandan Nayampally, chief commerc... » read more

Curvilinear Masks Push The Limits Of Inspection And Metrology


Key Takeaways: Curvilinear masks require native data flows across design, mask data prep, writing, inspection, and metrology. Inspection is shifting from finding all defects to identifying which mask variations actually print on wafer. High-NA EUV will intensify inspection challenges, particularly for small printable defects and actinic contrast limits. Experts at the table... » read more

Mask Technology Faces A New Set Of Challenges


Key Takeaways: Mask inspection and repair remain the critical bottleneck, even as multi-beam writers have reduced mask-writing constraints. Curvilinear masks are becoming viable for critical layers, but qualification, metrology, and inspection standards still lag production needs. Scaling curvilinear requires curvilinear-native data flows, model-based checks, GPU/HPC compute, and les... » read more

Designing Chips In The Context Of Rapidly Evolving AI


Key Takeaways: Agentic edge AI drives long-lived, tool-mediated loops with variable demands for compute, tokens, and memory. Edge PPA is dominated by memory hierarchy and data movement, forcing tight feature triage and robust RAS. Rapid model churn (multimodal, MoE, new formats) requires programmable, headroom-rich compute, interconnect, and runtime. Experts At The Table: Ch... » read more

Can Edge AI Keep Up?


Key Takeaways: Model development is outpacing silicon design cycles, so edge AI architectures must prioritize adaptability. The required cadence for model updates is highly application-dependent and is closely tied to product lifetime and operational risk. Adaptability can conflict with power, performance, and area targets, so effective heterogeneous architectures and robust softwa... » read more

AI Growing Impact On Chip Design And EDA Tools


Key Takeaways Many workflows in the data center are customer-specific, which is part of the reason there is so much interest in agentic AI-enabled tools. Large systems companies are pressing EDA vendors for performance improvements to keep pace with their AI workflows. The makeup of design teams is changing as AI infiltrates more of the chip design process. Experts at the Ta... » read more

Fast Isn’t Fast Enough: Redefining Metrics for Edge AI


Key Takeaways: Edge AI performance is about low latency and power efficiency, not peak TOPS. Memory bandwidth and data movement now limit edge AI more than compute. Successful edge AI requires balanced hardware, software, and fast model updates. Experts At The Table: Today’s chip architect must contend with multiple factors when architecting AI processors for fast and effi... » read more

AI’s Potential And Limitations In Chip Design


Experts at the Table: Semiconductor Engineering sat down to discuss the opportunities and challenges of using AI in chip design, with Thomas Andersen, vice president for AI & Machine Learning at Synopsys; Sridhar Boinapally, senior director of analog/mixed signal tools/flow at Intel; Alex Starr, corporate fellow at AMD; Stuart Oberman, vice president for GPU hardware engineering at Nvidia; ... » read more

Tool And Methodology Changes Coming In Fab And Package Automation


Experts at the table: Semiconductor Engineering sat down to discuss what's changing in semiconductor fabs and packaging houses with Michael Lowman, senior product marketing manager for Data Analytics at Cohu; Aftkhar Aslam, CEO at yieldWerx, Woo Young Han, product marketing director at Onto Innovation; and Lihong Cao, senior director of engineering and technical marketing for ASE. What foll... » read more

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