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Process Variation Analysis Of Device Performance Using Virtual Fabrication — Methodology Demonstrated On A CMOS 14-nm FinFET Vehicle


A new methodology is demonstrated to assess the impact of fabrication inherent process variability on 14-nm fin field effect transistor (FinFET) device performance. A model of a FinFET device was built using virtual device fabrication and testing. The model was subsequently calibrated on Design of Experiment corner case data that had been collected on a limited number of processed fab wafers. W... » read more

More Than Data Management


By Ann Steffora Mutschler Managing the people, the data and the technology are just as important as meeting the market window given that without these, the entire project wouldn’t function. Throw huge data set sizes, different cultures and business management issues into the mix and the challenges are many. Fortunately, these are issues that the semiconductor industry has been refining for ... » read more